Hydrogen Sulfide

Hydrogen Sulfide

SCHEMBL2066280

O[Si](O)(O)O.S.S.S.S

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Sulfide SCHEMBL2066279 1.00
Hydrogen Sulfide SCHEMBL7062702 0.91
Fluoride SCHEMBL27265054 0.91
Hydrogen Sulfide SCHEMBL15240995 0.91
Hydrogen Sulfide SCHEMBL27662646 0.91
Hydrogen Sulfide SCHEMBL28118811 0.91
SCHEMBL8425118 0.89
SCHEMBL6264766 0.89
Charcoal, Activated SCHEMBL29440 0.89
SCHEMBL11227552 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8148831-B2 Latent catalyst for epoxy resin, epoxy resin composition, and semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-04-03 US disclosed
US-20090023840-A1 LATENT CATALYST FOR EPOXY RESIN, EPOXY RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE HORIMOTO AKIHIRO 2009-01-22 US disclosed
US-20070010601-A1 Latent catalyst for epoxy resin, epoxy resin composition, and semiconductor device SUMOTOMO BAKELITE COMPANY LIMITED (JP) 2007-01-11 US disclosed
US-6982188-B1 Post CMP precursor treatment ADVANCED MICRO DEVICES, INC (US) 2006-01-03 US disclosed
US-6936545-B1 Organic memory cell formation on Ag substrate ADVANCED MICRO DEVICES, INC. (US) 2005-08-30 US disclosed
US-20050075474-A1 Latent catalyst for epoxy resin, epoxy resin composition, and semiconductor device SUMITOMO BAKELITE COMPANY LIMITED (JP) 2005-04-07 US disclosed
CN-1436159-A Processes for production of fluorinated organic compounds and fluorinating agent DAIKIN IND LTD (JP) 2003-08-13 CN disclosed
US-6422918-B1 Chemical-mechanical polishing of photoresist layer ADVANCED MICRO DEVICES, INC. 2002-07-23 US disclosed