Oxalic Acid

Oxalic Acid

SCHEMBL2069769

O.O=C([O-])C(=O)[O-].[Cs+].[Cs+]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

OPRM1SLC6A4

The experimentally established mechanism targets of Oxalic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Oxalic Acid SCHEMBL7981840 0.94 CA4 (0.78)
Oxalic Acid SCHEMBL234978 0.94 CA4 (0.78)
Oxalic Acid SCHEMBL7620105 0.94 CA4 (0.78)
Oxalic Acid SCHEMBL169342 0.94
Oxalic Acid SCHEMBL2722478 0.94 CA4 (0.78)
Oxalic Acid SCHEMBL28387560 0.94 CA4 (0.78)
Oxalic Acid SCHEMBL30992041 0.94 CA4 (0.78)
Oxalic Acid SCHEMBL72980 0.94
Oxalic Acid SCHEMBL25291950 0.89 CA4 (0.70)
Oxalic Acid SCHEMBL25276643 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8637404-B2 Metal cations for initiating polishing CABOT MICROELECTRONICS CORPORATION (US) 2014-01-28 US disclosed
US-20110065364-A1 METAL CATIONS FOR INITIATING POLISHING CABOT MICROELECTRONICS CORPORATION 2011-03-17 US disclosed
WO-2007038399-A2 METAL CATIONS FOR INITIATING CHEMICAL MECHANICAL POLISHING CABOT MICROELECTRONICS CORPORATION (US) 2007-04-05 WO disclosed
US-20070068087-A1 Metal cations for initiating polishing CABOT MICROELECTRONICS CORPORATION 2007-03-29 US disclosed