SCHEMBL207449

SCHEMBL207449

C=C(C)C(=O)NCc1cc(C)c(O)c(C)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
TDP1 Q9NUW8 2/20 0.40
PTGS1 P23219 2/20 0.39
PTGS2 P35354 2/20 0.39
HMGB1 P09429 1/20 0.39
CXCL12 P48061 1/20 0.39
SHBG P04278 1/20 0.37
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
HTT P42858 1/20 0.34
ALDH1A1 P00352 2/20 0.34
MAPT P10636 2/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2B6 P20813 1/20 0.33
POLB P06746 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17041929 0.85 PTGS1 (0.41) MEN1KMT2APTGS1PTGS2HMGB1
SCHEMBL20239098 0.84 SELL (0.43) L3MBTL1TDP1PTGS1HTTALDH1A1
SCHEMBL9187028 0.82 ESR1 (0.49) PTGS1ALDH1A1MAPTALPGLMNA
SCHEMBL5436067 0.82 KMT2A (0.47) MEN1KMT2AL3MBTL1TDP1PTGS1
SCHEMBL11795666 0.81 TRPV1 (0.43) MEN1KMT2ATDP1PTGS1HTT
SCHEMBL11801454 0.79 TRPV1 (0.39) KMT2ATDP1POLBGAA
SCHEMBL4330346 0.79 GAA (0.51) MEN1KMT2ATDP1CA1CA2
SCHEMBL11800157 0.79 GAA (0.46) CA1CA2HTTALDH1A1MAPT
SCHEMBL731190 0.77 KMT2A (0.50) MEN1KMT2AL3MBTL1HTTALDH1A1
SCHEMBL11793579 0.76 TRPV1 (0.42) PTGS2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 216 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023007972-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION 日産化学株式会社 2023-02-02 WO disclosed
WO-2023007941-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SPECIFIC COPOLYMER 日産化学株式会社 2023-02-02 WO disclosed
US-20200262192-A1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA NV (BE) 2020-08-20 US disclosed
CN-106463425-B Method for manufacturing solder electrode and laminate, and electronic component JSR株式会社 2020-06-23 CN disclosed
US-10632734-B2 Lithographic printing plate precursor comprising graphite oxide AGFA NV (BE) 2020-04-28 US disclosed
CN-107848290-B Lithographic printing plate precursors comprising graphite oxide 爱克发有限公司 2019-10-18 CN disclosed
EP-3170662-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR AGFA NV (BE) 2019-08-14 EP disclosed
US-20180207925-A1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR COMPRISING GRAPHITE OXIDE AGFA NV (BE) 2018-07-26 US disclosed
CN-108290406-A Lithographic printing plate precursor 爱克发有限公司 2018-07-17 CN disclosed
EP-3121008-B1 A LITHOGRAPHIC PRINTING PLATE PRECURSOR COMPRISING GRAPHITE OXIDE AGFA NV (BE) 2018-06-13 EP disclosed
EP-0749429-A1 3,5-DISUBSTITUTED AND 3,5,6-TRISUBSTITUTED 2-ISOXAZOLINES AND ISOXAZOLES, PROCESS FOR PREPARING THE SAME AND THEIR USE AS MEDICAMENTS HOECHST AKTIENGESELLSCHAFT (DE) 1996-12-27 EP disclosed
EP-0731113-A2 Polymers and photosensitive compositions obtained therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1996-09-11 EP disclosed
EP-0528203-B1 Radiation-sensitive composition containing a polymeric binder having units of alpha,beta-unsaturated carboxamides HOECHST AG (DE) 1995-10-11 EP disclosed
WO-1995024397-A1 3,5-DISUBSTITUTED AND 3,5,6-TRISUBSTITUTED 2-ISOXAZOLINES AND ISOXAZOLES, PROCESS FOR PREPARING THE SAME AND THEIR USE AS MEDICAMENTS HOECHST AKTIENGESELLSCHAFT (DE) 1995-09-14 WO disclosed
EP-0347660-B1 Light-sensitive composition and light-sensitive registration material prepared therefrom HOECHST AG (DE) 1995-03-22 EP disclosed
US-5328973-A Acid labile protecting groups are cleaved by strong acid formed by ultraviolet radiation, solubility of polymer is changed HOECHST AKTIENGESELLSCHAFT (DE) 1994-07-12 US disclosed
EP-0528203-A1 Radiation-sensitive composition containing a polymeric binder having units of alpha,beta-unsaturated carboxamides HOECHST AKTIENGESELLSCHAFT (DE) 1993-02-24 EP disclosed
EP-0363776-A2 Light-sensitive composition and light-sensitive copy material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1990-04-18 EP disclosed
EP-0347660-A2 Light-sensitive composition and light-sensitive registration material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1989-12-27 EP disclosed
US-3991139-A NORBORNENE DERIVATIVES, PHENOLS, ESTER THIOETHERS SHOWA DENKO KABUSHIKI KAISHA (JA) 1976-11-09 US disclosed