SCHEMBL207875

SCHEMBL207875

FC(F)(F)[C]C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8728354 0.71
SCHEMBL17136267 0.71
SCHEMBL443045 0.62
SCHEMBL4184176 0.62
SCHEMBL569978 0.59
SCHEMBL829504 0.59
SCHEMBL3730082 0.59
SCHEMBL459761 0.59
SCHEMBL195488 0.59
SCHEMBL465091 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3591 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116033956-B Membrane process for recovering H2 from a sulfur recovery tail gas stream of a sulfur recovery unit and a more environmentally friendly sales gas process 沙特阿拉伯石油公司 2024-07-09 CN claimed
US-20240210831-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-06-27 US claimed
CN-118222092-A Polyimide composition, polyimide film and preparation method thereof 比亚迪股份有限公司 2024-06-21 CN claimed
CN-118176241-A Polyamic acid varnish, polyimide composition, and adhesive 三井化学株式会社 2024-06-11 CN claimed
US-20240184206-A1 LAMINATE, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR PATTERNING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-06-06 US claimed
US-20240160105-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-05-16 US claimed
EP-4365679-A1 LAYERED BODY, METHOD FOR MANUFACTURING LAYERED BODY, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-05-08 EP claimed
EP-4361192-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-05-01 EP claimed
WO-2024075581-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN COATING, PHOTOSENSITIVE DRY FILM, PATTERN FORMING METHOD, AND LIGHT-EMITTING ELEMENT 信越化学工業株式会社 2024-04-11 WO claimed
CN-114026150-B Polyamide-imide resin, resin composition, and semiconductor device 株式会社力森诺科 2024-04-05 CN claimed
EP-0226313-A1 Partially crystalline poly(sulfone ester) resin ARCO CHEMICAL TECHNOLOGY, INC. (US) 1987-06-24 EP claimed
US-4645820-A MOLDING MATERIAL FROM DIHYDRIC PHENOL, BIS(A,A-DISUBSTITUTED ACETIC ACID) SULFONE, AND 4,4*-BENZOPHENONE DICARBOXYLIC ACID ATLANTIC RICHFIELD COMPANY (US) 1987-02-24 US claimed
EP-0210763-A1 Moldable polyester-sulfone thermoplastic resin ARCO CHEMICAL TECHNOLOGY, INC. (US) 1987-02-04 EP claimed
EP-0210136-A2 Curable polyether resins CIBA-GEIGY AG (CH) 1987-01-28 EP claimed
US-4614767-A FROM DIHYDRIC PHENOL AND A BISCA,A-DISUBSTITUTED ACETIC ACID ATLANTIC RICHFIELD COMPANY (US) 1986-09-30 US claimed
WO-1986002368-A1 AROMATIC POLY(ETHER KETONES) HAVING IMIDE, AMIDE, ESTER, AZO, QUINOXALINE, BENZIMIDAZOLE, BENZOXAZOLE OR BENZOTHIAZOLE GROUPS AND METHOD OF PREPARATION RAYCHEM CORPORATION (US) 1986-04-24 WO claimed
EP-0178185-A2 Novel aromatic polymers RAYCHEM CORPORATION (a Delaware corporation) (US) 1986-04-16 EP claimed
EP-0092310-B1 BIS(HALOPHENYL)HEXAFLUOROPROPANES AND PROCESS FOR MAKING THE SAME Hughes Aircraft Company (US) 1985-07-24 EP claimed
EP-0092310-A1 Bis(halophenyl)hexafluoropropanes and process for making the same Hughes Aircraft Company (US) 1983-10-26 EP claimed
US-4370501-A Synthesis of bis(aminophenyl) compounds HUGHES AIRCRAFT COMPANY (US) 1983-01-25 US claimed