⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2079951 | 0.98 | CA1 (0.36) | — | |
| SCHEMBL2079298 | 0.98 | CA1 (0.36) | — | |
| SCHEMBL2080426 | 0.98 | CA1 (0.36) | — | |
| SCHEMBL1092664 | 0.93 | — | — | |
| SCHEMBL7077764 | 0.85 | — | — | |
| SCHEMBL874698 | 0.85 | — | — | |
| Methyl Alcohol SCHEMBL7523022 | 0.78 | — | — | |
| SCHEMBL10715845 | 0.75 | CA1 (0.40) | — | |
| SCHEMBL8523479 | 0.73 | CA1 (0.39) | — | |
| SCHEMBL16705145 | 0.72 | CA1 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250296918-A1 | METHOD FOR PRODUCING MERCAPTO HETEROCYCLIC COMPOUND AND METHOD FOR TESTING THE SAME | RESONAC CORPORATION (JP) | 2025-09-25 | — | — | US | disclosed |
| WO-2023210608-A1 | PRODUCTION METHOD AND TEST METHOD FOR MERCAPTO HETEROCYCLIC COMPOUND | 株式会社レゾナック | 2023-11-02 | — | — | WO | disclosed |
| US-10995154-B2 | Environmentally friendly process for the preparation of nanocellulose and derivatives thereof | ORGANOFUEL SWEDEN AB (SE) | 2021-05-04 | — | — | US | disclosed |
| US-20180346607-A1 | Environmentally Friendly Process For The Preparation Of Nanocellulose And Derivatives Thereof | ORGANOFUEL SWEDEN AB (SE) | 2018-12-06 | — | — | US | disclosed |
| EP-3380526-A1 | ENVIRONMENTALLY FRIENDLY PROCESS FOR THE PREPARATION OF NANOCELLULOSE AND DERIVATIVES THEREOF | Organofuel Sweden AB (SE) | 2018-10-03 | — | — | EP | disclosed |
| WO-2017089413-A1 | ENVIRONMENTALLY FRIENDLY PROCESS FOR THE PREPARATION OF NANOCELLULOSE AND DERIVATIVES THEREOF | CÓRDOVA ARMANDO (SE) | 2017-06-01 | — | — | WO | disclosed |
| WO-2015198923-A1 | COMPOSITION FOR KERATIN FIBERS | L'OREAL (FR) | 2015-12-30 | — | — | WO | disclosed |
| US-8961946-B2 | Hair processing agent and method for permanent waving hair | SHOWA DENKO K.K. (JP) | 2015-02-24 | — | — | US | disclosed |
| EP-2024330-B1 | PRODUCTION METHOD OF HETEROCYCLIC MERCAPTO COMPOUND | SHOWA DENKO KK (JP) | 2012-04-25 | — | — | EP | disclosed |
| US-7902383-B2 | Production method of heterocyclic mercapto compound | SHOWA DENKO K.K. (JP) | 2011-03-08 | — | — | US | disclosed |
| US-20080131389-A1 | Hair Relaxer | SHOWA DENKO K.K. (JP) | 2008-06-05 | — | — | US | disclosed |
| US-20080085251-A1 | even at a neutral to weakly acidic pH; a lactone or lactam having a mercapto group; with thioglycolic acid, thiolactic acid, cysteine, acetylcysteine, cysteamine, acylcysteamine; | RESONAC CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| EP-1896139-A2 | PERMANENT WAVING AND SIMULTANEOUSLY COLORING AGENT | Showa Denko K.K. (JP) | 2008-03-12 | — | — | EP | disclosed |
| WO-2007139215-A1 | PRODUCTION METHOD OF HETEROCYCLIC MERCAPTO COMPOUND | SHOWA DENKO K.K. (JP) | 2007-12-06 | — | — | WO | disclosed |
| EP-1827370-A1 | HAIR PROCESSING AGENT AND METHOD FOR PERMANENT WAVING HAIR | Showa Denko K.K. (JP) | 2007-09-05 | — | — | EP | disclosed |
| WO-2006121214-A2 | PERMANENT WAVING AND SIMULTANEOUSLY COLORING AGENT | SHOWA DENKO K.K. (JP) | 2006-11-16 | — | — | WO | disclosed |
| WO-2006068276-A1 | HAIR PROCESSING AGENT AND METHOD FOR PERMANENT WAVING HAIR | SHOWA DENKO K.K. (JP) | 2006-06-29 | — | — | WO | disclosed |
| US-6787193-B2 | DECOMPOSITION OF AN ORGANOSILICON COMPOUND | JSR CORPORATION (JP) | 2004-09-07 | — | — | US | disclosed |
| US-20030008155-A1 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2003-01-09 | — | — | US | disclosed |
| EP-1267395-A2 | Method for the formation of silica film, silica film, insulating film, and semiconductor device | JSR Corporation (JP) | 2002-12-18 | — | — | EP | disclosed |