⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16256232 | 0.73 | — | — | |
| SCHEMBL18588159 | 0.67 | — | — | |
| Dimethyl Sulfone SCHEMBL169867 | 0.65 | KDM4E (1.00) | — | |
| Dimethyl Sulfone SCHEMBL19382 | 0.65 | — | — | |
| SCHEMBL23781786 | 0.64 | — | — | |
| SCHEMBL28734156 | 0.64 | — | — | |
| SCHEMBL17668905 | 0.60 | — | — | |
| SCHEMBL13822807 | 0.60 | — | — | |
| SCHEMBL28626172 | 0.60 | — | — | |
| SCHEMBL17107858 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106292207-B | Photoresist residue cleaning solution | 安集微电子科技（上海）股份有限公司 | 2021-06-25 | — | — | CN | claimed |
| CN-106292207-A | A kind of photoresistance residual washing liquid | 安集微电子科技(上海)有限公司 | 2017-01-04 | — | — | CN | claimed |
| CN-112118917-B | Electrode roller cleaning device and cleaning method | 株式会社LG新能源 | 2023-05-09 | — | — | CN | disclosed |
| CN-115611887-A | Heterogeneous chiral phase transfer catalyst and synthesis method and application thereof | 上海沿盈商贸有限公司 | 2023-01-17 | — | — | CN | disclosed |
| EP-3196236-B1 | VERTICAL ALIGNMENT FILM COMPRISING (CO)POLYMER OF CYCLIC OLEFIN COMPOUND | LG CHEMICAL LTD (KR) | 2019-04-10 | — | — | EP | disclosed |