⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19852580 | 0.87 | — | — | |
| SCHEMBL24946065 | 0.83 | RXFP1 (0.31) | — | |
| SCHEMBL25985085 | 0.81 | MEN1 (0.31) | — | |
| SCHEMBL19846358 | 0.79 | KDM4E (0.30) | — | |
| SCHEMBL25476635 | 0.78 | — | — | |
| SCHEMBL13079578 | 0.78 | KDM4E (0.42) | — | |
| SCHEMBL19756114 | 0.78 | PTPN2 (0.38) | — | |
| SCHEMBL19846360 | 0.77 | KDM4E (0.36) | — | |
| SCHEMBL20799738 | 0.75 | — | — | |
| SCHEMBL19846366 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11048165-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-06-29 | — | — | US | disclosed |
| US-20190113842-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-04-18 | — | — | US | disclosed |