SCHEMBL20912419

SCHEMBL20912419

O=C(O)CCCCOCc1cccs1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.58
HPGD P15428 2/20 0.50
POLB P06746 2/20 0.49
TDP1 Q9NUW8 1/20 0.49
USP2 O75604 1/20 0.46
ALDH1A1 P00352 3/20 0.46
TSHR P16473 3/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
SLC1A3 P43003 1/20 0.46
SLC1A2 P43004 1/20 0.46
SLC1A1 P43005 1/20 0.46
CYP2C19 P33261 1/20 0.44
LTA4H P09960 1/20 0.43
PPARA Q07869 2/20 0.41
RAB9A P51151 1/20 0.40
HDAC3 O15379 1/20 0.39
HDAC1 Q13547 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC10 Q969S8 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13419906 0.98 NPC1 (0.57) NPC1HPGDPOLBTDP1USP2
SCHEMBL20912424 0.95 NPC1 (0.56) NPC1HPGDPOLBTDP1USP2
SCHEMBL20912418 0.89 POLB (0.53) NPC1HPGDPOLBTDP1USP2
SCHEMBL29114055 0.85 NPC1 (0.63) NPC1HPGDPOLBTDP1USP2
SCHEMBL20912445 0.81 NPC1 (0.62) NPC1HPGDPOLBTDP1USP2
SCHEMBL8906376 0.80 TAAR1 (0.41) NPC1HPGDPOLBUSP2ALDH1A1
SCHEMBL8906381 0.80 TAAR1 (0.41) NPC1POLBUSP2ALDH1A1TSHR
Butyric Acid SCHEMBL28207227 0.80 POLB (0.44) NPC1POLBTDP1ALDH1A1TSHR
SCHEMBL5195846 0.78 SLC1A3 (0.51) NPC1HPGDPOLBTDP1USP2
SCHEMBL6041511 0.78 TAAR1 (0.42) NPC1POLBUSP2ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11269251-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-08 US disclosed
US-20190113844-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-04-18 US disclosed