SCHEMBL20915810

SCHEMBL20915810

CCCc1c2ccccc2c(CCC)c2c(Oc3c(C)ccc4c(CCC)c5ccccc5c(CCC)c34)c(C)ccc12

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 6/20 0.42
ALDH1A1 P00352 4/20 0.42
HPGD P15428 2/20 0.42
GAA P10253 1/20 0.42
RAB9A P51151 1/20 0.36
TSHR P16473 3/20 0.34
CYP1A2 P05177 3/20 0.33
HTT P42858 2/20 0.33
CYP2D6 P10635 1/20 0.33
SLC2A1 P11166 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CYP3A4 P08684 1/20 0.31
HSD17B10 Q99714 1/20 0.31
NCEH1 Q6PIU2 1/20 0.31
LMNA P02545 1/20 0.31
NOS2 P35228 1/20 0.30
MAPT P10636 1/20 0.30
RAD52 P43351 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20915497 0.92 KDM4E (0.39) KDM4EALDH1A1HPGDGAARAB9A
SCHEMBL20915482 0.91 KDM4E (0.37) KDM4EALDH1A1HPGDGAATSHR
SCHEMBL20915421 0.89 KDM4E (0.38) KDM4EALDH1A1HPGDGAATSHR
SCHEMBL20915690 0.89 KDM4E (0.38) KDM4EALDH1A1HPGDGAATSHR
SCHEMBL20915411 0.89 KDM4E (0.38) KDM4EALDH1A1HPGDGAATSHR
SCHEMBL20915299 0.89 KDM4E (0.38) KDM4EALDH1A1HPGDGAATSHR
SCHEMBL20915789 0.89 KDM4E (0.38) KDM4EALDH1A1HPGDGAATSHR
SCHEMBL20915584 0.87 CYP1A2 (0.33) CYP1A2RAD52
SCHEMBL20915809 0.86 CYP1A2 (0.32) CYP1A2
SCHEMBL20915598 0.85 MYC (0.33) RAD52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11149103-B2 Photopolymerization sensitizer composition and photopolymerizable composition comprising the same KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-10-19 US disclosed
CN-108026197-B Photopolymerizable composition 川崎化成工业株式会社 2020-11-17 CN disclosed
US-20190119426-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION AND PHOTOPOLYMERIZABLE COMPOSITION COMPRISING THE SAME KAWASAKI KASEI CHEMICALS LTD. (JP) 2019-04-25 US disclosed
CN-108026197-A Photopolymerizable composition 川崎化成工业株式会社 2018-05-11 CN disclosed