SCHEMBL209175

SCHEMBL209175

CCC(C(C)=O)C(=O)[O-].CCC(C(C)=O)C(=O)[O-].CCC(C(C)=O)C(=O)[O-].CCC(C(C)=O)C(=O)[O-].[Zr+4]

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.39
TSHR P16473 2/20 0.39
NFKB1 P19838 2/20 0.39
NPSR1 Q6W5P4 2/20 0.39
CA2 P00918 2/20 0.37
CA1 P00915 4/20 0.35
FFAR3 O14843 2/20 0.32
HDAC3 O15379 2/20 0.32
HDAC1 Q13547 2/20 0.32
HDAC2 Q92769 2/20 0.32
HDAC8 Q9BY41 2/20 0.32
ALDH1A1 P00352 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CA4 P22748 1/20 0.32
GAA P10253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1230539 0.97 CYP3A4 (0.37) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL1230696 0.97 CYP3A4 (0.37) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL1229436 0.97 CYP3A4 (0.37) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL1230706 0.95 CYP3A4 (0.36) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL1230925 0.95 CYP3A4 (0.36) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL1229405 0.95 CYP3A4 (0.36) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21219169 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21219167 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL9577856 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2
SCHEMBL21219171 0.95 CYP3A4 (0.39) CYP3A4TSHRNFKB1NPSR1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1499 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108205246-B Electrophotographic belt and electrophotographic image forming apparatus 佳能株式会社 2021-05-07 CN claimed
EP-2895517-B1 TWO-COMPONENT POLYURETHANE COMPOSITION SIKA TECH AG (CH) 2020-12-16 EP claimed
EP-3336611-B1 ELECTROPHOTOGRAPHIC BELT AND ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS CANON KK (JP) 2019-10-02 EP claimed
EP-2895519-B1 STRUCTURAL POLYURETHANE ADHESIVE WITH LOW GLASS TRANSITION TEMPERATURE SIKA TECH AG (CH) 2018-10-31 EP claimed
US-20180173136-A1 ELECTROPHOTOGRAPHIC BELT AND ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS CANON KABUSHIKI KAISHA (JP) 2018-06-21 US claimed
EP-3336611-A1 ELECTROPHOTOGRAPHIC BELT AND ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS Canon Kabushiki Kaisha (JP) 2018-06-20 EP claimed
EP-2895517-A1 TWO-COMPONENT POLYURETHANE COMPOSITION Sika Technology AG (CH) 2015-07-22 EP claimed
EP-2895519-A1 STRUCTURAL POLYURETHANE ADHESIVE HAVING A LOW GLASS TRANSITION TEMPERATURE Sika Technology AG (CH) 2015-07-22 EP claimed
WO-2014040992-A1 STRUCTURAL POLYURETHANE ADHESIVE HAVING A LOW GLASS TRANSITION TEMPERATURE SIKA TECHNOLOGY AG (CH) 2014-03-20 WO claimed
WO-2014040922-A1 TWO-COMPONENT POLYURETHANE COMPOSITION SIKA TECHNOLOGY AG (CH) 2014-03-20 WO claimed
US-7772320-B2 High scratch-resistance and high elasticity coating materials based on alkoxysilane functional components BASF CORPORATION (DE) 2010-08-10 US claimed
US-20080047469-A1 Highly Scratch-Resistant and Highly Elastic Coating Agents Based on Alkoxysilane Functional Components BASF COATINGS AG (DE) 2008-02-28 US claimed
EP-0824127-B1 Water-type dispersion composition JSR CORP (JP) 2004-07-14 EP claimed
US-5922633-A THERMAL LATENT ACID CATALYST CONSISTS OF AN EPOXY COMPOUND, A SULFUR COMPOUND AND LEWIS ACID NOF CORPORATION (JP) 1999-07-13 US claimed
US-5905109-A HYDROLYSIS AND CONDENSATION TO FORM POLYMERS WITH CATALYSTS JSR CORPORATION (JP) 1999-05-18 US claimed
EP-0824127-A2 Water-type dispersion composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-02-18 EP claimed
EP-0555879-B1 Coating composition and process for manufacturing the same JAPAN SYNTHETIC RUBBER CO LTD (JP) 1997-05-07 EP claimed
US-5306759-A Hardenable mixture of a silanetriol, vinyl resin having a silanediol or -triol group, chelate compound, solvent and diketone or ketoester; storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-04-26 US claimed
EP-0555879-A1 Coating composition and process for manufacturing the same JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-08-18 EP claimed
US-4927884-A POLYSILOXANE, EPOXY-VINYL, CHELATE COMPOUND KANSAI PAINT CO., LIMITED (JP) 1990-05-22 US claimed