Trimethylammonium

Trimethylammonium

SCHEMBL2095381

CCCC=C(C)C(=O)O.CN(C)C

nearest known ligand 0.40

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Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 2/20 0.40
GRIK2 Q13002 1/20 0.40
CD81 P60033 2/20 0.38
EP300 Q09472 1/20 0.38
PPARG P37231 1/20 0.33
BACE1 P56817 1/20 0.32
FNTA P49354 1/20 0.31
FNTB P49356 1/20 0.31
ALDH1A1 P00352 1/20 0.31
PTGS1 P23219 1/20 0.30
AKR1C3 P42330 1/20 0.30
TBXAS1 P24557 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trimethylammonium SCHEMBL2095380 1.00 GRIK1 (0.40) GRIK1GRIK2CD81EP300PPARG
Trimethylammonium SCHEMBL1232741 0.98 GRIK1 (0.39) GRIK1GRIK2CD81EP300PPARG
Trimethylammonium SCHEMBL1232740 0.98 GRIK1 (0.39) GRIK1GRIK2CD81EP300PPARG
SCHEMBL10387626 0.93
SCHEMBL23311 0.93
SCHEMBL23310 0.93
Hydrochloric Acid SCHEMBL9902111 0.91 GRIK1 (0.42) GRIK1GRIK2CD81EP300PPARG
SCHEMBL5072777 0.91 GRIK1 (0.42) GRIK1GRIK2CD81EP300PPARG
Ammonia Solution, Strong SCHEMBL27627939 0.91 GRIK1 (0.42) GRIK1GRIK2CD81EP300PPARG
Hydrochloric Acid SCHEMBL9902118 0.91 GRIK1 (0.42) GRIK1GRIK2CD81EP300PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8163100-B2 Synthetic microgel polymer compositions for treating and/or modifying hard surfaces RHODIA OPERATIONS (FR) 2012-04-24 US disclosed
US-20100224317-A1 METHOD FOR FORMING GRAFT POLYMER PATTERN AND METHOD FOR FORMING ELECTRICALLY CONDUCTIVE PATTERN FUJIFILM CORPORATION (JP) 2010-09-09 US disclosed
US-20100004152-A1 Synthetic Microgel Polymer Compositions for Treating and/or Modifying Hard Surfaces RHODIA OPERATIONS (FR) 2010-01-07 US disclosed
US-20080318087-A1 MAGNETIC RECORDING MEDIUM, AND METHOD OF MANUFACTURE THEREOF FUJIFILM CORPORATION (JP) 2008-12-25 US disclosed
US-20080004390-A1 ORGANIC-INORGANIC HYBRID MATERIAL, METHOD OF PRODUCING THE SAME, AND SUPERHYDROPHILIC MATERIAL FUJIFILM CORPORATION (JP) 2008-01-03 US disclosed
US-7056642-B2 First forming a polymerization initiating layer, which is immobilized on a PET support by a crosslinking reaction, then bonding an acrylate monomer by irradiating; making a printing plate with pattern, photolithography FUJI PHOTO FILM CO., LTD. (JP) 2006-06-06 US disclosed
US-20060116470-A1 Production of aqueous dispersions of cationic homo-and copolymers using amphoteric protective colloids BASF AKTIENGESELLSCHAFT (DE) 2006-06-01 US disclosed
EP-1546224-B1 THE PRODUCTION OF AQUEOUS DISPERSIONS OF CATIONIC HOMO- AND COPOLYMERS USING AMPHOTERIC PROTECTIVE COLLOIDS BASF AG (DE) 2006-05-17 EP disclosed
EP-1400544-B1 A method of graft polymerization and variety of materials utilizing the same as well as producing method thereof FUJI PHOTO FILM CO LTD (JP) 2005-12-28 EP disclosed
EP-1546224-A1 THE PRODUCTION OF AQUEOUS DISPERSIONS OF CATIONIC HOMO- AND COPOLYMERS USING AMPHOTERIC PROTECTIVE COLLOIDS BASF AKTIENGESELLSCHAFT (DE) 2005-06-29 EP disclosed
US-20040067434-A1 First forming a polymerization initiating layer, which is immobilized on a PET support by a crosslinking reaction, then bonding an acrylate monomer by irradiating; making a printing plate with pattern, photolithography FUJI PHOTO FILM CO., LTD. 2004-04-08 US disclosed
EP-1400544-A1 A method of graft polymerization and variety of materials utilizing the same as well as producing method thereof FUJI PHOTO FILM CO., LTD. (JP) 2004-03-24 EP disclosed
WO-2004022615-A1 THE PRODUCTION OF AQUEOUS DISPERSIONS OF CATIONIC HOMO- AND COPOLYMERS USING AMPHOTERIC PROTECTIVE COLLOIDS BASF AKTIENGESELLSCHAFT (DE) 2004-03-18 WO disclosed
EP-1396508-A1 The production of aqueous dispersions of cationic homo- and copolymers using amphoteric protective colloids BASF AKTIENGESELLSCHAFT (DE) 2004-03-10 EP disclosed