Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL20959632

CCCCOCCOC(=O)/C=C\C(=O)O.N

nearest known ligand 0.77

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 7/20 0.77
ATM Q13315 1/20 0.63
MAPT P10636 1/20 0.49
RAB9A P51151 1/20 0.49
NPSR1 Q6W5P4 1/20 0.49
TSHR P16473 5/20 0.46
HPGD P15428 1/20 0.46
ALDH1A1 P00352 3/20 0.41
TP53 P04637 2/20 0.41
HIF1A Q16665 2/20 0.41
HSD17B10 Q99714 1/20 0.41
APP P05067 1/20 0.39
CYP3A4 P08684 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12971098 0.98 HCAR2 (0.79) HCAR2ATMMAPTRAB9ANPSR1
SCHEMBL28689583 0.98 HCAR2 (0.79) HCAR2ATMMAPTRAB9ANPSR1
SCHEMBL31266492 0.98 HCAR2 (0.79) HCAR2ATMMAPTRAB9ANPSR1
SCHEMBL2890706 0.98 HCAR2 (0.79) HCAR2ATMMAPTRAB9ANPSR1
SCHEMBL2898517 0.98 HCAR2 (0.79) HCAR2ATMMAPTRAB9ANPSR1
SCHEMBL9053240 0.92 HCAR2 (0.81) HCAR2ATMMAPTRAB9ANPSR1
SCHEMBL1947729 0.92 HCAR2 (0.81) HCAR2ATMMAPTRAB9ANPSR1
SCHEMBL29483378 0.92 HCAR2 (0.81) HCAR2ATMMAPTRAB9ANPSR1
SCHEMBL12971144 0.92 HCAR2 (0.81) HCAR2ATMMAPTRAB9ANPSR1
SCHEMBL27855298 0.92 HCAR2 (0.81) HCAR2ATMMAPTRAB9ANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116925648-A Polishing composition for chemical mechanical polishing, preparation method and application thereof 深圳市拉达特科技有限公司 2023-10-24 CN disclosed
US-11713404-B2 Polishing agent, polishing method, and liquid additive for polishing AGC Inc. (JP) 2023-08-01 US disclosed
US-11041096-B2 Polishing agent, polishing method, and liquid additive for polishing AGC Inc. (JP) 2021-06-22 US disclosed
US-20190136089-A1 POLISHING AGENT, POLISHING METHOD, AND LIQUID ADDITIVE FOR POLISHING AGC INC (JP) 2019-05-09 US disclosed