⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704471 | 0.83 | — | — | |
| SCHEMBL2101579 | 0.82 | TSHR (0.32) | — | |
| SCHEMBL29000737 | 0.78 | TSHR (0.40) | — | |
| SCHEMBL704642 | 0.78 | — | — | |
| SCHEMBL707424 | 0.78 | — | — | |
| SCHEMBL2269764 | 0.75 | — | — | |
| SCHEMBL2395792 | 0.75 | — | — | |
| SCHEMBL2104675 | 0.73 | — | — | |
| SCHEMBL2270666 | 0.71 | — | — | |
| SCHEMBL705558 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0963992-A2 | Method for preparation of tertiary-hydrocarbylsilyl compounds | DOW CORNING CORPORATION (US) | 1999-12-15 | — | — | EP | claimed |
| US-5872274-A | Method for preparation of tertiary-hydrocarbylsilyl compounds | DOW CORNING CORPORATION (US) | 1999-02-16 | — | — | US | claimed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |
| EP-1999167-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | Novolen Technology Holdings, C.V. (NL) | 2008-12-10 | — | — | EP | disclosed |
| WO-2007106348-A2 | ZIEGLER-NATTA CATALYST WITH IN SITU-GENERATED DONOR | NOVOLEN TECHNOLOGY HOLDINGS C.V. (NL) | 2007-09-20 | — | — | WO | disclosed |
| US-20070213204-A1 | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECHNOLOGY HOLDINGS C.V. | 2007-09-13 | — | — | US | disclosed |
| EP-0963992-A2 | Method for preparation of tertiary-hydrocarbylsilyl compounds | DOW CORNING CORPORATION (US) | 1999-12-15 | — | — | EP | disclosed |
| US-5872274-A | Method for preparation of tertiary-hydrocarbylsilyl compounds | DOW CORNING CORPORATION (US) | 1999-02-16 | — | — | US | disclosed |