SCHEMBL21025517

SCHEMBL21025517

C/C=C(C)\C(=C/C)C(=O)c1ccc2c(c1)C(CCCC)(CCCC)c1cc(C(=O)C(=O)OCOC(C)(C)CC)ccc1-2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21024711 0.80 PDK2 (0.42) —
SCHEMBL21024796 0.69 PDK2 (0.35) —
SCHEMBL21024688 0.68 PDK2 (0.34) —
SCHEMBL18012730 0.67 MAPT (0.35) —
SCHEMBL21183147 0.67 PDK2 (0.42) —
SCHEMBL21024775 0.66 PDK2 (0.35) —
SCHEMBL21183150 0.65 PDK2 (0.34) —
SCHEMBL21183191 0.65 PDK2 (0.34) —
SCHEMBL28944088 0.65 RARB (0.45) —
SCHEMBL18012817 0.65 PDK2 (0.36) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10976660-B2 Fluorene photoinitiator, preparation method therefor, photocurable composition having same, and use of same in photocuring field CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO , LTD. (CN) 2021-04-13 — — US disclosed
US-20190155153-A1 Fluorene Photoinitiator, Preparation Method Therefor, Photocurable Composition Having Same, and Use of Same in Photocuring Field CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD. (CN) 2019-05-23 — — US disclosed
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