⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2101337 | 0.79 | — | — | |
| SCHEMBL31691504 | 0.70 | — | — | |
| SCHEMBL2103411 | 0.69 | — | — | |
| SCHEMBL21423305 | 0.69 | — | — | |
| SCHEMBL2269651 | 0.67 | — | — | |
| SCHEMBL4025312 | 0.65 | — | — | |
| SCHEMBL2103852 | 0.65 | TSHR (0.35) | — | |
| SCHEMBL2268850 | 0.64 | — | — | |
| SCHEMBL2102827 | 0.64 | — | — | |
| SCHEMBL2100373 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040033445-A1 | Method of forming a photoresist pattern and method for patterning a layer using a photoresist | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-02-19 | — | — | US | claimed |
| EP-0671483-B1 | Method for vapor deposition of a ceramic coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM SPA (IT) | 1997-12-29 | — | — | EP | claimed |
| EP-0540084-B1 | Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons | ENICHEM SPA (IT) | 1996-09-04 | — | — | EP | claimed |
| EP-0671483-A1 | Ceramic vapor deposited coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM S.p.A. (IT) | 1995-09-13 | — | — | EP | claimed |
| US-5424095-A | Decomposing organosilicon precursor inside chemical reactor to form film of ceramic material on surface; prevents coking | ENIRICERCHE S.P.A. (IT) | 1995-06-13 | — | — | US | claimed |
| EP-0540084-A1 | Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons | ENICHEM S.p.A. (IT) | 1993-05-05 | — | — | EP | claimed |
| US-5208069-A | Silane precursor | ISTITUTO GUIDO DONEGANI S.P.A. (IT) | 1993-05-04 | — | — | US | claimed |
| US-20240030026-A1 | PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM | Kokusai Electric Corporation (JP) | 2024-01-25 | — | — | US | disclosed |
| WO-2022264430-A1 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE, AND PROGRAM | 株式会社KOKUSAI ELECTRIC | 2022-12-22 | — | — | WO | disclosed |
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |
| EP-0228095-A2 | Process for the preparation of olefinic silanes and siloxanes | UNION CARBIDE CORPORATION (US) | 1987-07-08 | — | — | EP | disclosed |
| US-4668812-A | Process for the preparation of olefinic silanes and siloxanes | UNION CARBIDE CORPORATION (US) | 1987-05-26 | — | — | US | disclosed |
| US-4515932-A | ROOM TEMPERATURE VULCANIZATION | GENERAL ELECTRIC COMPANY (US) | 1985-05-07 | — | — | US | disclosed |
| EP-0137883-A1 | End-capping catalyst for forming alcoxy-functional one component RTV compositions | GENERAL ELECTRIC COMPANY (US) | 1985-04-24 | — | — | EP | disclosed |
| EP-0112434-A2 | Hydrogen bearing silyl carbamates | UNION CARBIDE CORPORATION (US) | 1984-07-04 | — | — | EP | disclosed |
| US-4417042-A | Scavengers for one-component alkoxy-functional RTV compositions and processes | GENERAL ELECTRIC COMPANY (US) | 1983-11-22 | — | — | US | disclosed |
| US-4400526-A | Hydrogen bearing silyl carbamates | UNION CARBIDE CORPORATION (US) | 1983-08-23 | — | — | US | disclosed |