SCHEMBL2109506

SCHEMBL2109506

C=CC(OC(C=C)C(Cl)Cl)C(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL950067 0.78
SCHEMBL388226 0.75
SCHEMBL11868010 0.69 MEN1 (0.33)
SCHEMBL331406 0.67
SCHEMBL3763738 0.65
SCHEMBL1444840 0.65
SCHEMBL3263987 0.65
SCHEMBL83336 0.65
SCHEMBL9563155 0.63
SCHEMBL8995463 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0198277-B1 DISELENO-BIS-BENZAMIDES OF PRIMARY AND SECONDARY AMINES, PROCESSES FOR THEIR PRODUCTION AND PHARMACEUTICAL PREPARATIONS CONTAINING THEM A. Nattermann & Cie. GmbH (DE) 1989-05-03 EP claimed
EP-0098934-B1 2-METHYLSELENO-BENZAMIDES A. Nattermann & Cie. GmbH (DE) 1985-12-27 EP claimed
EP-2476662-B1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2018-05-30 EP disclosed
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed
US-8158650-B2 Substituted phenylmethyl bicyclocarboxyamide compounds PFIZER INC. (US) 2012-04-17 US disclosed
EP-2222631-B1 SUBSTITUTED PHENYLMETHYL BICYCLOCARBOXYAMIDE COMPOUNDS PFIZER (US) 2011-08-17 EP disclosed
EP-2222631-A2 SUBSTITUTED PHENYLMETHYL BICYCLOCARBOXYAMIDE COMPOUNDS Pfizer Inc. (US) 2010-09-01 EP disclosed
US-20100087480-A1 SUBSTITUTED PHENYLMETHYL BICYCLOCARBOXYAMIDE COMPOUNDS PFIZER INC. 2010-04-08 US disclosed
WO-2008050199-A2 SUBSTITUTED PHENYLMETHYL BICYCLOCARBOXYAMIDE COMPOUNDS PFIZER JAPAN INC. (JP) 2008-05-02 WO disclosed
US-5453533-A Enzyme inhibitor THE UNIVERSITY OF ALABAMA AT BIRMINGHAM (US) 1995-09-26 US disclosed
US-5162523-A CEPHALOSPORIN ANTIBACTERIAL COMPOUNDS HOFFMANN-LA ROCHE INC. (US) 1992-11-10 US disclosed
US-5159077-A Bactericide, antibiotic HOFFMANN-LA ROCHE INC. (US) 1992-10-27 US disclosed
EP-0409081-A1 Beta-Lactam Derivatives F. HOFFMANN-LA ROCHE AG (CH) 1991-01-23 EP disclosed
US-4873350-A Diselenobis-benzoic acid amides of primary and secondary amines and processes for the treatment of diseases in humans caused by a cell injury A NATTERMANN & CIE GMBH (DE) 1989-10-10 US disclosed
EP-0044453-B1 NEW BENZISOSELENAZOLONES, PROCESS FOR PRODUCING THE SAME AND PHARMACEUTICAL PREPARATIONS CONTAINING THE SAME A. Nattermann & Cie. GmbH (DE) 1984-04-11 EP disclosed
EP-0098934-A1 2-Methylseleno-benzamides A. Nattermann & Cie. GmbH (DE) 1984-01-25 EP disclosed
US-4418069-A Benzisoselenazolones and process for the treatment of rheumatic and arthritic diseases using them A. NATTERMANN & CIE GMBH (DE) 1983-11-29 US disclosed
EP-0044453-A2 New benzisoselenazolones, process for producing the same and pharmaceutical preparations containing the same A. Nattermann & Cie. GmbH (DE) 1982-01-27 EP disclosed