⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24255 | 0.82 | — | — | |
| SCHEMBL8279244 | 0.82 | — | — | |
| SCHEMBL7643783 | 0.76 | — | — | |
| SCHEMBL3676932 | 0.76 | — | — | |
| SCHEMBL3656458 | 0.76 | — | — | |
| SCHEMBL23254193 | 0.76 | — | — | |
| SCHEMBL24091978 | 0.76 | — | — | |
| SCHEMBL7632960 | 0.76 | — | — | |
| SCHEMBL14099431 | 0.76 | — | — | |
| SCHEMBL23363 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1024 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4423165-B1 | A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK | HUBERGROUP DEUTSCHLAND GMBH (DE) | 2025-09-24 | — | — | EP | claimed |
| CN-119751872-A | Composition containing aromatic secondary amine alcohol and application thereof | 益丰新材料股份有限公司 | 2025-04-04 | — | — | CN | claimed |
| US-20250034320-A1 | A polymer being suitable as inert component of a radiation curing coating and in particular of a radiation curing ink | HUBERGROUP DEUTSCHLAND GMBH (DE) | 2025-01-30 | — | — | US | claimed |
| EP-3581600-B1 | RESIN LENS AND PREPARATION METHOD THEREFOR | EFIRM NEW MAT CO LTD (CN) | 2025-01-08 | — | — | EP | claimed |
| EP-4423165-A1 | A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK | hubergroup Deutschland GmbH (DE) | 2024-09-04 | — | — | EP | claimed |
| CN-113943410-B | Quantum dot film, preparation method thereof and quantum dot light-emitting diode | TCL科技集团股份有限公司 | 2024-02-06 | — | — | CN | claimed |
| CN-117362566-A | High-refractive-index composite material, and preparation method and application thereof | 益丰新材料股份有限公司 | 2024-01-09 | — | — | CN | claimed |
| CN-117143340-A | Preparation method and application of enol-terminated sulfhydryl compound | 益丰新材料股份有限公司 | 2023-12-01 | — | — | CN | claimed |
| CN-116948127-A | Preparation method of optical resin lens | 益丰新材料股份有限公司 | 2023-10-27 | — | — | CN | claimed |
| WO-2023094257-A1 | A POLYMER BEING SUITABLE AS INERT COMPONENT OF A RADIATION CURING COATING AND IN PARTICULAR OF A RADIATION CURING INK | HUBERGROUP DEUTSCHLAND GMBH (DE) | 2023-06-01 | — | — | WO | claimed |
| CN-110591624-A | Mercaptan modified room temperature fast curing epoxy adhesive prepolymer and preparation method thereof | 山东益丰生化环保股份有限公司 | 2019-12-20 | — | — | CN | claimed |
| WO-2017025244-A1 | COSMETIC PROCESS FOR TREATING KERATIN MATERIALS | L'OREAL (FR) | 2017-02-16 | — | — | WO | claimed |
| US-9371226-B2 | Methods for forming particles | BATTELLE ENERGY ALLIANCE, LLC (US) | 2016-06-21 | — | — | US | claimed |
| WO-2016050786-A1 | COSMETIC PROCESS FOR ATTENUATING WRINKLES | L'OREAL (FR) | 2016-04-07 | — | — | WO | claimed |
| WO-2016050788-A1 | COSMETIC PROCESS FOR ATTENUATING WRINKLES | L'OREAL (FR) | 2016-04-07 | — | — | WO | claimed |
| US-8231848-B1 | One-pot synthesis of chalcopyrite-based semi-conductor nanoparticles | SUN HARMONICS LTD (CN) | 2012-07-31 | — | — | US | claimed |
| US-20020177740-A1 | CATALYST PROMOTOR FOR THE MANUFACTURE OF POLYPHENOLS | RESOLUTION PERFORMANCE PRODUCTS LLC | 2002-11-28 | — | — | US | claimed |
| US-6465697-B1 | REACTIN A PHENOLIC COMPOUND REACTANT, A CARBONYL COMPOUND REACTANT, AND A CATALYST PROMOTER COMPRISING A DITHIOKETAL COMPOUND IN THE PRESENCE OF AN ACID CATALYST. | RESOLUTION PERFORMANCE PRODUCTS LLC | 2002-10-15 | — | — | US | claimed |
| US-6225439-B1 | FOR OPTICAL MATERIALS, SUCH AS PLASTIC LENSES, PRISMS, SUBSTRATES OF INFORMATION RECORDING MATERIALS AND FILTERS | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-01 | — | — | US | claimed |
| US-6117923-A | OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-09-12 | — | — | US | claimed |