⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10141590 | 1.00 | — | — | |
| SCHEMBL22855769 | 1.00 | — | — | |
| SCHEMBL14867122 | 0.86 | — | — | |
| SCHEMBL19803965 | 0.86 | — | — | |
| SCHEMBL24497169 | 0.86 | — | — | |
| SCHEMBL21567771 | 0.85 | — | — | |
| SCHEMBL4687141 | 0.85 | — | — | |
| SCHEMBL24760226 | 0.85 | — | — | |
| SCHEMBL4686438 | 0.85 | — | — | |
| SCHEMBL22006058 | 0.82 | NPC1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220411727-A1 | CLEANING COMPOSITION, METHOD OF CLEANING COATING FILM FORMING DEVICE, METHOD OF PRODUCING SUBSTRATE FOR LITHOGRAPHY, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-12-29 | — | — | US | disclosed |
| US-11150554-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-10-19 | — | — | US | disclosed |
| US-20190196329-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |