Vinyl Ether

Vinyl Ether

SCHEMBL2111702

C=COC=C.O=C1C=CC(=O)N1

nearest known ligand 0.58

Full drug profile on Sugi Atlas →

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
GSK3A P49840 1/20 0.58
GSK3B P49841 1/20 0.58
CCR6 P51684 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7168465 0.82 GSK3A (0.55) GSK3AGSK3BCCR6
Butadiene SCHEMBL1020118 0.80 GSK3A (0.69) GSK3AGSK3BCCR6
Propene SCHEMBL28291988 0.78 GSK3A (0.65) GSK3AGSK3BCCR6
Vinyl Chloride SCHEMBL10516224 0.78 GSK3A (0.65) GSK3AGSK3BCCR6
SCHEMBL17747995 0.78 GSK3A (0.65) GSK3AGSK3BCCR6
Formaldehyde SCHEMBL8731039 0.76
Ethylene SCHEMBL6060832 0.76
SCHEMBL1599522 0.76
SCHEMBL7021498 0.76
SCHEMBL10990 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105122501-B Protected electrode structure 锡安能量公司 2019-02-19 CN claimed
CN-105122501-A Protected electrode structures BASF SE 2015-12-02 CN claimed
US-5104646-A Hydrophobically modified nonionic water soluble polymer, water soluble surfactant, compatible solvent THE PROCTER & GAMBLE COMPANY (US) 1992-04-14 US claimed
CN-114830373-A Lithium metal electrode 赛昂能源有限公司 2022-07-29 CN disclosed
CN-111279526-A Protective film for electrochemical cell 赛昂能源有限公司 2020-06-12 CN disclosed
CN-105122501-B Protected electrode structure 锡安能量公司 2019-02-19 CN disclosed
EP-3019548-B1 PROCESS FOR THE MANUFACTURING OF ABS-MOLDING COMPOSITIONS INEOS STYROLUTION GROUP GMBH (DE) 2019-01-30 EP disclosed
US-10174229-B2 Adhesive resins for wafer bonding INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2019-01-08 US disclosed
US-20180072926-A1 ADHESIVE RESINS FOR WAFER BONDING INTERNATIONAL BUSINESS MACHINES CORPORATION 2018-03-15 US disclosed
US-9850406-B2 Adhesive resins for wafer bonding INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2017-12-26 US disclosed
US-20160133499-A1 ADHESIVE RESINS FOR WAFER BONDING INTERNATIONAL BUSINESS MACHINES CORPORATION 2016-05-12 US disclosed
EP-1115751-A1 PHOTOPOLYMERIZATION PROCESS AND COMPOSITION EMPLOYING A CHARGE TRANSFER COMPLEX AND CATIONIC PHOTOINITIATOR Fusion Uv Systems, Inc. (US) 2001-07-18 EP disclosed
US-6127447-A RADIATION CURABLE COATING COMPOSITION INCLUDES AN EFFECTIVE AMOUNT OF CATIONIC PHOTOINITIATOR IN COMBINATION WITH A CHARGE TRANSFER COMPLEX FUSION UV SYSTEMS, INC. (US) 2000-10-03 US disclosed
CN-1258573-A Method and apparatus for producing solidified coating film BASF AG (DE) 2000-07-05 CN disclosed
WO-2000014024-A1 RADIATION-CURABLE COATING COMPOSITIONS, COATED OPTICAL FIBER, RADIATION-CURABLE MATRIX FORMING MATERIAL AND RIBBON ASSEMBLY DSM N.V. (NL) 2000-03-16 WO disclosed
EP-0883652-B1 RADIATION CURABLE COATING COMPOSITION DSM NV (NL) 2000-03-15 EP disclosed
US-6025409-A COMPRISING (A) UNSATURATED COMPOUND HAVING AT LEAST ONE MALEATE, FUMERATE, ITACONATE, CITRACONATE OR MESACONATE GROUP; (B) AN UNSATURATED VINYLETHER COMPOUND AND A COMPOUND WHICH FORMS A STRONG EXCIPLEX WITH (A) OR (B); DSM N.V. (NL) 2000-02-15 US disclosed
WO-2000006613-A1 PHOTOPOLYMERIZATION PROCESS AND COMPOSITION EMPLOYING A CHARGE TRANSFER COMPLEX AND CATIONIC PHOTOINITIATOR FUSION UV SYSTEMS, INC. (US) 2000-02-10 WO disclosed
EP-0883652-A1 RADIATION CURABLE COATING COMPOSITION DSM N.V. (NL) 1998-12-16 EP disclosed
WO-1997031981-A1 RADIATION CURABLE COATING COMPOSITION DSM N.V. (NL) 1997-09-04 WO disclosed