⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26030 | 0.79 | — | — | |
| SCHEMBL2114055 | 0.78 | — | — | |
| Ammonia Solution, Strong SCHEMBL4994633 | 0.76 | — | — | |
| Water SCHEMBL28555745 | 0.76 | — | — | |
| Hydrochloric Acid SCHEMBL1844020 | 0.76 | — | — | |
| SCHEMBL23295170 | 0.76 | — | — | |
| SCHEMBL1237944 | 0.73 | TSHR (0.35) | — | |
| Methyl Alcohol SCHEMBL7117031 | 0.73 | — | — | |
| SCHEMBL1608795 | 0.73 | — | — | |
| SCHEMBL122540 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111910443-A | Graphene antibacterial coating and preparation method thereof | 苏州世韩纺织整理有限公司 | 2020-11-10 | — | — | CN | claimed |
| CN-120091905-A | Method for producing one or more topographical structures and plastic substrate | 卡尔蔡司光学国际有限公司 | 2025-06-03 | — | — | CN | disclosed |
| CN-116406451-B | Method for manufacturing an ophthalmic lens | 卡尔蔡司光学国际有限公司 | 2024-12-13 | — | — | CN | disclosed |
| CN-115989133-B | Method for manufacturing coated lenses | 卡尔蔡司光学国际有限公司 | 2024-09-13 | — | — | CN | disclosed |
| CN-116324591-B | Ophthalmic lens with antibacterial and/or antiviral properties and method for manufacturing same | 卡尔蔡司光学国际有限公司 | 2024-07-09 | — | — | CN | disclosed |
| CN-221303608-U | Ophthalmic lenses with antibacterial and/or antiviral properties | 卡尔蔡司光学国际有限公司 | 2024-07-09 | — | — | CN | disclosed |
| CN-116075368-B | Resin composition, cured product, method for producing same, and laminate | 三菱化学株式会社 | 2024-06-11 | — | — | CN | disclosed |
| US-11912889-B2 | Silicon-containing polymer, film-forming composition, method for forming silicon-containing polymer coating, method for forming silica coating, and production method for silicon-containing polymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| CN-116802550-A | Transparent article, in particular an ophthalmic lens, with antibacterial and/or antiviral properties and method for manufacturing same | 卡尔蔡司光学(中国)有限公司 | 2023-09-22 | — | — | CN | disclosed |
| CN-116802523-A | Ophthalmic lens with antibacterial and/or antiviral properties and method for manufacturing same | 卡尔蔡司光学国际有限公司 | 2023-09-22 | — | — | CN | disclosed |
| US-20060141693-A1 | Semiconductor multilayer interconnection forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-06-29 | — | — | US | disclosed |
| EP-1641908-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-04-05 | — | — | EP | disclosed |
| EP-1566836-A1 | SEMICONDUCTOR MULTILAYER INTERCONNECTION FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-08-24 | — | — | EP | disclosed |
| US-20050112383-A1 | Undercoating layer material for lithography and wiring forming method using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-05-26 | — | — | US | disclosed |
| US-20050074695-A1 | Undercoating material for wiring, embedded material, and wiring formation method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-04-07 | — | — | US | disclosed |
| WO-2004113486-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-29 | — | — | WO | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-20040121937-A1 | Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-06-24 | — | — | US | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |