SCHEMBL2116379

SCHEMBL2116379

C=COCC(C=C(C)C(=O)O)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9767228 0.79 PTGS1 (0.32)
SCHEMBL2114534 0.79 TSHR (0.33)
SCHEMBL620897 0.76
SCHEMBL1537673 0.74
SCHEMBL2889656 0.72
SCHEMBL4923060 0.72 CHRM1 (0.38)
SCHEMBL2964635 0.71
SCHEMBL25288939 0.71
SCHEMBL25358201 0.69 TSHR (0.50)
SCHEMBL2113452 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12036808-B2 Ink jet recording method using temporary curing radiation SEIKO EPSON CORPORATION (JP) 2024-07-16 US disclosed
EP-3470477-A1 RADIATION-CURABLE INK JET INK COMPOSITION AND INK JET RECORDING METHOD Seiko Epson Corporation (JP) 2019-04-17 EP disclosed
US-9873808-B2 Ultraviolet-curable ink jet ink composition SEIKO EPSON CORPORATION (JP) 2018-01-23 US disclosed
US-9796193-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-24 US disclosed
US-9782982-B2 Ink jet recording method, ultraviolet curable ink and ink jet recording apparatus SEIKO EPSON CORPORATION (JP) 2017-10-10 US disclosed
US-9469771-B2 Ultraviolet ray-curable clear ink composition and recording method SEIKO EPSON CORPORATION (JP) 2016-10-18 US disclosed
US-20160152044-A1 INK JET RECORDING METHOD, ULTRAVIOLET CURABLE INK AND INK JET RECORDING APPARATUS SEIKO EPSON CORP (JP) 2016-06-02 US disclosed
US-9346290-B2 Image recording apparatus SEIKO EPSON CORPORATION (JP) 2016-05-24 US disclosed
US-20160083544-A1 COMPOSITION FOR FIBER-REINFORCED COMPOSITE MATERIAL, PREPREG, AND FIBER-REINFORCED COMPOSITE MATERIAL DAICEL CORPORATION (JP) 2016-03-24 US disclosed
US-9260618-B2 Ultraviolet-curable ink jet composition and storage body thereof SEIKO EPSON CORPORATION (JP) 2016-02-16 US disclosed
US-8564142-B2 Radiation curable ink jet ink composition and ink jet recording method SEIKO EPSON CORPORATION (JP) 2013-10-22 US disclosed
US-20130258015-A1 ULTRAVIOLET RAY-CURABLE CLEAR INK COMPOSITION AND RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2013-10-03 US disclosed
US-20120229583-A1 PHOTOCURABLE INK COMPOSITION, INK JET RECORDING METHOD, AND RECORDING MATTER SEIKO EPSON CORPORATION (JP) 2012-09-13 US disclosed
US-8236872-B2 Adhesive composition and optical member CHEIL INDUSTRIES, INC. (KR) 2012-08-07 US disclosed
US-20120147095-A1 INK COMPOSITION FOR ULTRAVIOLET CURABLE INK JETS, INK JET RECORDING APPARATUS USING THE SAME, INK JET RECORDING METHOD USING THE SAME, AND INK SET SEIKO EPSON CORPORATION (JP) 2012-06-14 US disclosed
US-8192804-B2 Photocurable ink composition, ink jet recording method, and recording matter SEIKO EPSON CORPORATION (JP) 2012-06-05 US disclosed
US-20120133059-A1 RADIATION CURABLE INK JET COMPOSITION, RECORDED MATTER, AND INK JET RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2012-05-31 US disclosed
US-8158214-B2 Photocurable ink composition set, ink jet recording method, and recorded matter SEIKO EPSON CORPORATION (JP) 2012-04-17 US disclosed
US-20110195249-A1 ADHESIVE COMPOSITION AND OPTICAL MEMBER Wuxi Hengxin Optoelectronic Materials Co., Ltd. (CN) 2011-08-11 US disclosed
US-20090041946-A1 Photocuable Ink Composition Set, Ink Jet Recording Method, and Recorded Matter SEIKO EPSON CORPORATION (JP) 2009-02-12 US disclosed