⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3343256 | 0.86 | — | — | |
| SCHEMBL524541 | 0.78 | — | — | |
| SCHEMBL2115558 | 0.75 | — | — | |
| SCHEMBL1987796 | 0.73 | — | — | |
| SCHEMBL5252593 | 0.73 | — | — | |
| SCHEMBL3344134 | 0.72 | — | — | |
| SCHEMBL3346553 | 0.72 | — | — | |
| SCHEMBL3341370 | 0.72 | — | — | |
| SCHEMBL1995513 | 0.71 | — | — | |
| SCHEMBL3342333 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2555053-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-18 | — | — | EP | disclosed |
| EP-2162429-B1 | HALOGEN-CONTAINING ORGANOSULFUR COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL CO (JP) | 2016-04-13 | — | — | EP | disclosed |
| EP-2555053-A1 | Positive-type photosensitive resin composition | Toray Industries, Inc. (JP) | 2013-02-06 | — | — | EP | disclosed |
| EP-2110708-B1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2012-12-05 | — | — | EP | disclosed |
| US-8247596-B2 | Halogen-containing organosulfur compound and use thereof | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-21 | — | — | US | disclosed |
| US-8158324-B2 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2012-04-17 | — | — | US | disclosed |
| US-20100160422-A1 | HALOGEN-CONTAINING ORGANOSULFUR COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100099041-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES, INC. (JP) | 2010-04-22 | — | — | US | disclosed |
| EP-2162429-A2 | HALOGEN-CONTAINING ORGANOSULFUR COMPOUND AND USE THEREOF | Sumitomo Chemical Company, Limited (JP) | 2010-03-17 | — | — | EP | disclosed |
| EP-2110708-A1 | POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Toray Industries, Inc. (JP) | 2009-10-21 | — | — | EP | disclosed |
| WO-2009005110-A2 | HALOGEN-CONTAINING ORGANOSULFUR COMPOUND AND USE THEREOF | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-01-08 | — | — | WO | disclosed |