⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10239107 | 1.00 | — | — | |
| SCHEMBL22166789 | 1.00 | — | — | |
| SCHEMBL12151848 | 1.00 | — | — | |
| SCHEMBL12257045 | 1.00 | — | — | |
| SCHEMBL19264547 | 0.96 | KDM4E (0.35) | — | |
| SCHEMBL15139328 | 0.96 | KDM4E (0.35) | — | |
| Bicarbonate SCHEMBL10990897 | 0.85 | TFPI2 (0.52) | — | |
| SCHEMBL15139349 | 0.76 | PPM1B (0.31) | — | |
| SCHEMBL14218655 | 0.74 | — | — | |
| SCHEMBL12892285 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10591819-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-17 | — | — | US | disclosed |
| US-20190235381-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-08-01 | — | — | US | disclosed |