Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | EYA2 | O00167 | 1/20 | 0.44 |
| ▸ | APP | P05067 | 1/20 | 0.44 |
| ▸ | ACE | P12821 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 2/20 | 0.42 |
| ▸ | PMP22 | Q01453 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 1/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
| ▸ | DRD1 | P21728 | 1/20 | 0.42 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.42 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.42 |
| ▸ | DRD3 | P35462 | 1/20 | 0.42 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.42 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14678812 | 1.00 | TDP1 (0.44) | TDP1EYA2APPACEBLM | |
| SCHEMBL3342184 | 1.00 | TDP1 (0.44) | TDP1EYA2APPACEBLM | |
| SCHEMBL7763065 | 0.98 | TDP1 (0.42) | TDP1EYA2APPACEBLM | |
| SCHEMBL9339696 | 0.98 | TDP1 (0.42) | TDP1EYA2APPACEBLM | |
| SCHEMBL5150641 | 0.98 | TDP1 (0.42) | TDP1EYA2APPACEBLM | |
| SCHEMBL8762937 | 0.98 | TDP1 (0.42) | TDP1EYA2APPACEBLM | |
| Nitrilotriacetic Acid SCHEMBL11157276 | 0.98 | TDP1 (0.42) | TDP1EYA2APPACEBLM | |
| Water SCHEMBL7859765 | 0.98 | TDP1 (0.42) | TDP1EYA2APPACEBLM | |
| Ammonia Solution, Strong SCHEMBL10700936 | 0.98 | TDP1 (0.42) | TDP1EYA2APPACEBLM | |
| Ammonia Solution, Strong SCHEMBL29827849 | 0.96 | TDP1 (0.41) | TDP1EYA2APPACEBLM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 6036 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4499765-B1 | COMPOSITIONS AND METHODS FOR TUNGSTEN ETCHING INHIBITION | BASF SE (DE) | 2026-05-06 | — | — | EP | claimed |
| EP-4087904-B1 | DERIVATIZED POLYAMINO ACIDS | CMC MAT LLC (US) | 2026-01-28 | — | — | EP | claimed |
| EP-3956411-B1 | SURFACE COATED ABRASIVE PARTICLES FOR TUNGSTEN BUFF APPLICATIONS | CMC MAT LLC (US) | 2025-12-10 | — | — | EP | claimed |
| US-20250368859-A1 | SILICA-BASED SLURRY FOR SELECTIVE POLISHING OF CARBON-BASED FILMS | ENTEGRIS INC (US) | 2025-12-04 | — | — | US | claimed |
| US-12473457-B2 | Composition for tungsten CMP | CMC MATERIALS LLC (US) | 2025-11-18 | — | — | US | claimed |
| EP-4642935-A1 | COMPOSITIONS AND METHODS FOR LEACHING HIGH-VALUE METALS | pH7 Technologies Inc. (CA) | 2025-11-05 | — | — | EP | claimed |
| EP-4608949-A2 | DETERGENTS AND CLEANING COMPOSITIONS WITH STABILIZED ENZYME | Symrise AG (DE) | 2025-09-03 | — | — | EP | claimed |
| US-12388113-B2 | Diaphragm and high-voltage battery comprising same | ZHUHAI COSMX BATTERY CO., LTD. (CN) | 2025-08-12 | — | — | US | claimed |
| EP-4590777-A1 | TUNGSTEN CMP COMPOSITION INCLUDING A SULFUR CONTAINING ANIONIC SURFACTANT | CMC Materials LLC (US) | 2025-07-30 | — | — | EP | claimed |
| US-20250215266-A1 | COMPOSITIONS AND METHODS FOR TUNGSTEN ETCHING INHIBITION | BASF SE (DE) | 2025-07-03 | — | — | US | claimed |
| EP-0117105-B1 | METHOD FOR THE PROCESSING OF SILVER HALIDE PHOTOGRAPHIC LIGHT-SENSITIVE MATERIALS | KONICA CORPORATION (JP) | 1987-09-16 | — | — | EP | claimed |
| US-4666528-A | AMINO POLYCARBOXYLIC ACID AND A PHOSPHONIC ACID | HALLIBURTON COMPANY (US) | 1987-05-19 | — | — | US | claimed |
| EP-0204197-A2 | Method for processing a silver halide color photographic material | FUJI PHOTO FILM CO., LTD. (JP) | 1986-12-10 | — | — | EP | claimed |
| US-4615780-A | Method of removing oxides of sulfur and oxides of nitrogen from exhaust gases | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) | 1986-10-07 | — | — | US | claimed |
| EP-0117105-A2 | Method for the processing of silver halide photographic light-sensitive materials | KONICA CORPORATION (JP) | 1984-08-29 | — | — | EP | claimed |
| US-4444873-A | BLEACHING WITH SOLUTION OF FERRIC SALT, ORGANIC ACID AND HALIDE; FIXING WITH POLYCARBONYLIC ACID SOLUTION | FUJI PHOTO FILM CO., LTD. (JP) | 1984-04-24 | — | — | US | claimed |
| US-4377625-A | AMINOCARBOXYLIC ACID, POLYAMINE OR AMINOALCOHOL CHELATING AGENT | DURACELL INC. (US) | 1983-03-22 | — | — | US | claimed |
| US-4044101-A | SULFITE, IRON ION, AMINOPOLYCARBOXYLIC ACID, REDUCTION | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) | 1977-08-23 | — | — | US | claimed |
| US-3997348-A | FERRIC SALT BLEACHING SOLUTION | FUJI PHOTO FILM CO., LTD. (JA) | 1976-12-14 | — | — | US | claimed |
| US-3984522-A | Method of removing nitrogen monoxide from a nitrogen monoxide-containing gas | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JA) | 1976-10-05 | — | — | US | claimed |