SCHEMBL2123390

SCHEMBL2123390

CCCCCCCCCCCCCCCC[Si](C)(C)Br

nearest known ligand 0.47

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.47
THRB P10828 1/20 0.47
DNM1 Q05193 7/20 0.36
ALDH1A1 P00352 3/20 0.36
LMNA P02545 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
HSD17B10 Q99714 1/20 0.36
SLC22A1 O15245 1/20 0.36
EPHX1 P07099 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2120322 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2122746 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2120466 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2121653 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2124376 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2122876 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2122047 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2120244 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2124080 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL2120809 1.00 TSHR (0.47) TSHRTHRBDNM1ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US claimed
CN-110612364-B Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2022-04-05 CN claimed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US claimed
CN-110612364-A Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2019-12-24 CN claimed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO claimed
US-11670512-B2 Selective deposition on silicon containing surfaces VERSUM MATERIALS US, LLC (US) 2023-06-06 US disclosed
CN-110612364-B Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2022-04-05 CN disclosed
US-20210118684-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC 2021-04-22 US disclosed
CN-110612364-A Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2019-12-24 CN disclosed
WO-2018170382-A1 SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES VERSUM MATERIALS US, LLC (US) 2018-09-20 WO disclosed
US-8592114-B2 Toner for developing electrostatic images ZEON CORPORATION (JP) 2013-11-26 US disclosed
US-20120094230-A1 TONER FOR DEVELOPING ELECTROSTATIC IMAGES ZEON CORPORATION (JP) 2012-04-19 US disclosed