SCHEMBL21248075

SCHEMBL21248075

CCCC1=C([Hf](OCC)(OCC)OCC)CC=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21247936 0.90
SCHEMBL21247675 0.84
SCHEMBL21248497 0.79
SCHEMBL21247778 0.79
SCHEMBL21247982 0.79
SCHEMBL887837 0.77
SCHEMBL16667156 0.76
SCHEMBL21248187 0.74
SCHEMBL21248547 0.73
SCHEMBL29023871 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11485749-B2 Group 4 metal element-containing compounds, method of preparing the same, precursor compositions including the same for forming a film, and method of forming a film using the same UP CHEMICAL CO., LTD. (KR) 2022-11-01 US disclosed
US-20200361969-A1 GROUP 4 METAL ELEMENT-CONTAINING COMPOUNDS, METHOD OF PREPARING THE SAME, PRECURSOR COMPOSITIONS INCLUDING THE SAME FOR FORMING A FILM, AND METHOD OF FORMING A FILM USING THE SAME UP CHEMICAL CO., LTD. (KR) 2020-11-19 US disclosed
WO-2019156451-A1 GROUP IV METAL ELEMENT-CONTAINING COMPOUND, PREPARATION METHOD THEREFOR, PRECURSOR COMPOSITION COMPRISING SAME COMPOUND FOR FILM FORMATION, AND FILM FORMING METHOD USING SAME COMPOSITION 주식회사 유피케미칼 2019-08-15 WO disclosed