SCHEMBL2126552

SCHEMBL2126552

CC(N)C(C)(N)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18694858 0.96
Sulfuric Acid SCHEMBL17673121 0.85 TP53 (0.38)
SCHEMBL8400661 0.80
SCHEMBL5970117 0.80
SCHEMBL1371659 0.80
SCHEMBL3644046 0.80
SCHEMBL322175 0.80
SCHEMBL1153665 0.80
SCHEMBL144710 0.80
SCHEMBL6073309 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1752829-B1 Polymer-stripping composition and method for removing a polymer ROHM & HAAS ELECT MAT (US) 2012-04-25 EP claimed
US-7772174-B2 Polymer-stripping composition SKC HAAS DISPLAY FILMS CO., LTD. (KR) 2010-08-10 US claimed
US-20070037719-A1 remove polymer residues from electronic devices; reduce corrosion of underlying metal surfaces; non-aqueous solution of 1,3-propanediol, 2-methyl-1,3-propanediol, butanediol, or glycerol; glycol ether solvent; amine compound; nonionic surfactant; water-free ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-02-15 US claimed
EP-1752829-A2 Polymer-stripping composition Rohm and Haas Electronic Materials LLC (US) 2007-02-14 EP claimed
EP-0645440-B1 Process using amine blends to inhibit chloride corrosion in wet hydrocarbon condensing systems ONDEO NALCO ENERGY SERV LP (US) 2003-05-07 EP claimed
WO-2024203515-A1 RESIN COMPOSITION, RESIN COMPOSITION FOR METAL SURFACE TREATMENT, METHOD FOR PRODUCING METAL LAMINATE, AND METAL LAMINATE 株式会社ADEKA 2024-10-03 WO disclosed
US-20230017312-A1 CENTRALLY ACTIVE P38ALPHA INHIBITING COMPOUNDS SYNOVO GMBH (DE) 2023-01-19 US disclosed
CN-109988349-B Rubber composition for tire outer layer and pneumatic tire 住友橡胶工业株式会社 2022-11-08 CN disclosed
CN-106163278-B Alkanolamine sulfate water conditioners 亨斯迈石油化学有限责任公司 2022-09-02 CN disclosed
US-10150890-B2 CMP slurry composition for polishing copper and polishing method using the same SAMSUNG SDI CO., LTD. (KR) 2018-12-11 US disclosed
US-20170335139-A1 CMP SLURRY COMPOSITION FOR POLISHING COPPER AND POLISHING METHOD USING THE SAME SAMSUNG SDI CO., LTD. (KR) 2017-11-23 US disclosed
US-20170240517-A1 SYNTHESIS OF NON-IONIC AMPHIPHILES FROM 1,4-ANHYDROXYLITOL ARCHER DANIELS MIDLAND CO (US) 2017-08-24 US disclosed
EP-0790531-A1 A method for making an offset printing plate according to the silver salt diffusion transfer process AGFA-GEVAERT N.V. (BE) 1997-08-20 EP disclosed
EP-0782047-A1 Method for making a lithographic printing plate according to the silver salt diffusion transfer process AGFA-GEVAERT N.V. (BE) 1997-07-02 EP disclosed
EP-0779555-A1 Method for making a lithographic printing plate according to the silver salt diffusion transfer process AGFA-GEVAERT N.V. (BE) 1997-06-18 EP disclosed
US-5624784-A Kit of parts for making an alkaline processing liquid for processing a lithographic printing plate AFGA-GEVAERT N.V. (BE) 1997-04-29 US disclosed
US-5618653-A CONTAINING ALL NECESSARY ACTIVE MATERIALS AND HYDROPHOBIZING AGENT ON SURFACE OF SOLID PARTICLES AGFA-GEVAERT N.V. (BE) 1997-04-08 US disclosed
US-5597676-A Method for making improved imaging elements suitable for use in silver salt diffusion transfer process AGFA-GEVAERT. N.V. (BE) 1997-01-28 US disclosed
EP-0735069-A1 Process for producing aqueous polyurethane coating and coat therefrom Mitsubishi Chemical Corporation (JP) 1996-10-02 EP disclosed
EP-0701172-A1 A method for making imaging elements suitable for use in the silver salt diffusion transfer process AGFA-GEVAERT N.V. (BE) 1996-03-13 EP disclosed