Thiocyanic Acid

Thiocyanic Acid

SCHEMBL212855

N#CS.[KH]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 885 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117996077-A Polymer-based ion secondary battery electrode material based on cyanamide derivative and application thereof 南京工业大学 2024-05-07 CN claimed
US-11851585-B2 Polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2023-12-26 US claimed
US-20230203343-A1 POLISHING COMPOSITIONS AND METHODS OF USE THEREOF FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2023-06-29 US claimed
CN-115961282-A High-strength wear-resistant aluminum mobile phone middle frame and preparation method thereof 东莞富盛发智能科技有限公司 2023-04-14 CN claimed
CN-115819787-A Propane diamine thiocyano type supermolecule ferroelectric phase change functional material and preparation method thereof 新疆农业大学 2023-03-21 CN claimed
CN-113117721-B Cyano-functionalized g-C 3 N 4 Colloidal catalyst, preparation method and application thereof 中国科学技术大学 2022-12-23 CN claimed
EP-4103663-A1 POLISHING COMPOSITIONS AND METHODS OF USE THEREOF Fujifilm Electronic Materials U.S.A., Inc. (US) 2022-12-21 EP claimed
CN-114959771-A Nickel-based electrocatalyst and electrolytic cell for degrading formaldehyde wastewater by hydrogen production 南京信息工程大学 2022-08-30 CN claimed
CN-114945649-A Polishing composition and method of use thereof 富士胶片电子材料美国有限公司 2022-08-26 CN claimed
US-11414568-B2 Polishing compositions and methods of use thereof FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2022-08-16 US claimed
US-20040198793-A1 Chemical process and new intermediates SANOFI-SYNTHELABO (FR) 2004-10-07 US claimed
EP-1458787-A1 PROCESS FOR THE PRODUCTION OF BRANCHED MELT POLYCARBONATE BY LATE ADDITION OF FRIES-INDUCING CATALYST GENERAL ELECTRIC COMPANY (US) 2004-09-22 EP claimed
EP-1414860-A2 PAN-SPECIFIC MONOCLONAL ANTIBODY DakoCytomation Denmark A/S (DK) 2004-05-06 EP claimed
EP-1345897-A1 CHEMICAL PROCESS AND NEW INTERMEDIATES SANOFI-SYNTHELABO (FR) 2003-09-24 EP claimed
US-20030170192-A1 Permanent cosmetic composition for one-step permanent operation LIM, CHAE-SUNG (KR) 2003-09-11 US claimed
WO-2003059300-A1 ONE STEP PERMANENT COSMETIC COMPOSITION PARK, JUNGHYUN (KR) 2003-07-24 WO claimed
WO-2003057758-A1 PROCESS FOR THE PRODUCTION OF BRANCHED MELT POLYCARBONATE BY LATE ADDITION OF FRIES-INDUCING CATALYST GENERAL ELECTRIC COMPANY (US) 2003-07-17 WO claimed
US-6504002-B1 Melt strength GENERAL ELECTRIC COMPANY 2003-01-07 US claimed
WO-2002088185-A2 PAN-SPECIFIC MONOCLONAL ANTIBODY DAKOCYTOMATION DENMARK A/S (DK) 2002-11-07 WO claimed
WO-2002044150-A1 CHEMICAL PROCESS AND NEW INTERMEDIATES SANOFI-SYNTHELABO (FR) 2002-06-06 WO claimed