⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Charcoal, Activated SCHEMBL29637249 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL31222303 | 1.00 | — | — | |
| Charcoal, Activated SCHEMBL11118823 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL1147800 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL30352676 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL2460629 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL498646 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL6843951 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL2460628 | 0.87 | — | — | |
| Charcoal, Activated SCHEMBL29869608 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1069 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12538693-B2 | Light emitting panel and manufacturing method thereof, and light emitting apparatus | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2026-01-27 | — | — | US | claimed |
| US-20250323190-A1 | CAP LAYER FOR PAD OXIDATION PREVENTION | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2025-10-16 | — | — | US | claimed |
| CN-119899447-A | Antibacterial high-temperature-resistant PE material and preparation process thereof | 广州市蔼洋塑料工业有限公司 | 2025-04-29 | — | — | CN | claimed |
| CN-111180416-B | Semiconductor structure, preparation process thereof and semiconductor device | 长鑫存储技术有限公司 | 2025-04-25 | — | — | CN | claimed |
| CN-119764166-A | Grid side wall forming method and semiconductor product | 重庆芯联微电子有限公司 | 2025-04-04 | — | — | CN | claimed |
| CN-119698058-A | Method for manufacturing semiconductor device and semiconductor device | 武汉新芯集成电路股份有限公司 | 2025-03-25 | — | — | CN | claimed |
| CN-119673896-A | Chip packaging structure, preparation method thereof and electronic equipment | 北京芯力技术创新中心有限公司 | 2025-03-21 | — | — | CN | claimed |
| CN-119495670-A | Semiconductor structure, manufacturing method thereof and electronic equipment | 华为技术有限公司 | 2025-02-21 | — | — | CN | claimed |
| CN-119480869-A | Semiconductor device, semiconductor device manufacturing method, memory and memory system | 长江存储科技有限责任公司 | 2025-02-18 | — | — | CN | claimed |
| CN-115190756-B | Three-dimensional lattice structure high-temperature wave-absorbing material and preparation method thereof | 中国人民解放军国防科技大学 | 2025-02-11 | — | — | CN | claimed |
| US-4911992-A | Mixture of hydrogen silsesquioxane and metal oxide; drying and heating | DOW CORNING CORPORATION (US) | 1990-03-27 | — | — | US | claimed |
| EP-0337618-A1 | Ceramic coatings from the pyrolysis in ammonia of mixtures of silicate esters and other metal oxide precursors | DOW CORNING CORPORATION (US) | 1989-10-18 | — | — | EP | claimed |
| US-4849296-A | ELECTRONICS, PRINTED CIRCUITS | DOW CORNING CORPORATION (US) | 1989-07-18 | — | — | US | claimed |
| US-4847162-A | PASSIVATION | DOW CORNING CORPORATION (US) | 1989-07-11 | — | — | US | claimed |
| EP-0323186-A2 | Multilayer ceramic coatings from metal oxides and hydrogen silsequioxane resin ceramified in ammonia | DOW CORNING CORPORATION (US) | 1989-07-05 | — | — | EP | claimed |
| EP-0323103-A2 | Multilayer ceramics coatings from the ceramification of hydrogen silsesquioxane resin in the presence of ammonia | DOW CORNING CORPORATION (US) | 1989-07-05 | — | — | EP | claimed |
| US-4842888-A | PROTECTIVE COATINGS FOR ELECTRONICS | DOW CORNING CORPORATION (US) | 1989-06-27 | — | — | US | claimed |
| US-4822697-A | Platinum and rhodium catalysis of low temperature formation multilayer ceramics | DOW CORNING CORPORATION (US) | 1989-04-18 | — | — | US | claimed |
| EP-0270229-A2 | Platinum and rhodium catalysis of low temperature formation multilayer ceramics | DOW CORNING CORPORATION (US) | 1988-06-08 | — | — | EP | claimed |
| EP-0270231-A2 | Platinum or rhodium catalyzed multilayer ceramic coatings from hydrogen silsequioxane resin and metal oxides | DOW CORNING CORPORATION (US) | 1988-06-08 | — | — | EP | claimed |