⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29147747 | 1.00 | — | — | |
| SCHEMBL866057 | 1.00 | — | — | |
| SCHEMBL28726400 | 0.89 | — | — | |
| SCHEMBL669620 | 0.87 | — | — | |
| SCHEMBL2396281 | 0.75 | — | — | |
| Water SCHEMBL137856 | 0.75 | — | — | |
| SCHEMBL1005185 | 0.75 | — | — | |
| SCHEMBL21630982 | 0.75 | — | — | |
| SCHEMBL22635963 | 0.75 | — | — | |
| Phosphine SCHEMBL7736786 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120100304-A1 | MICROMETRIC DIRECT-WRITE METHODS FOR PATTERNING CONDUCTIVE MATERIAL AND APPLICATIONS TO FLAT PANEL DISPLAY REPAIR | NANOLNK, INC. | 2012-04-26 | — | — | US | disclosed |
| US-7691541-B2 | Additive and subtractive correction using direct write nanolithography; fine control over lateral dimensions and height | NANOINK, INC. (US) | 2010-04-06 | — | — | US | disclosed |
| EP-1556737-B1 | METHODS FOR FABRICATION OF NANOMETER-SCALE ENGINEERED STRUCTURES FOR MASK REPAIR APPLICATION | NANOINK INC (US) | 2008-12-31 | — | — | EP | disclosed |
| US-20080166259-A1 | Workability; heat resistance; fuel cells; exhaust gases; sensors | JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) | 2008-07-10 | — | — | US | disclosed |
| EP-1857205-A1 | SINGLE CRYSTALLINE NOBLE METAL ULTRATHIN FILM NANOPARTICLES FORMED USING, AS REACTION FIELD, ADSORBED MICELL FILM FORMED AT SOLID/LIQUID INTERFACE AND PROCESS FOR PRODUCING THE SAME | Japan Science and Technology Agency (JP) | 2007-11-21 | — | — | EP | disclosed |
| CN-101002513-A | Micrometric direct writing method of patterned conductive material and application of micrometric direct writing method in repairing flat panel display | NANOINK INC (US) | 2007-07-18 | — | — | CN | disclosed |
| EP-1726193-A2 | MICROMETRIC DIRECT-WRITE METHODS FOR PATTERNING CONDUCTIVE MATERIAL AND APPLICATIONS TO FLAT PANEL DISPLAY REPAIR | Nanoink, Inc. (US) | 2006-11-29 | — | — | EP | disclosed |
| EP-1665360-A2 | PROCESSES FOR FABRICATING CONDUCTIVE PATTERNS USING NANOLITHOGRAPHY AS A PATTERNING TOOL | Nanoink, Inc. (US) | 2006-06-07 | — | — | EP | disclosed |
| US-7005378-B2 | Processes for fabricating conductive patterns using nanolithography as a patterning tool | NANOINK, INC. (US) | 2006-02-28 | — | — | US | disclosed |
| US-20050235869-A1 | Micrometric direct-write methods for patterning conductive material and applications to flat panel display repair | NANOINK, INC. | 2005-10-27 | — | — | US | disclosed |
| WO-2005084092-A2 | MICROMETRIC DIRECT-WRITE METHODS FOR PATTERNING CONDUCTIVE MATERIAL AND APPLICATIONS TO FLAT PANEL DISPLAY REPAIR | NANOINK, INC. (US) | 2005-09-09 | — | — | WO | disclosed |
| EP-1556737-A2 | NANOMETER-SCALE ENGINEERED STRUCTURES, METHODS AND APPARATUS FOR FABRICATION THEREOF, AND APPLICATIONS TO MASK REPAIR, ENHANCEMENT, AND FABRICATION | Nanoink, Inc. (US) | 2005-07-27 | — | — | EP | disclosed |
| WO-2005037418-A2 | PROCESSES FOR FABRICATING CONDUCTIVE PATTERNS USING NANOLITHOGRAPHY AS A PATTERNING TOOL | NANOINK, INC. (US) | 2005-04-28 | — | — | WO | disclosed |
| US-20040175631-A1 | Additive and subtractive correction using direct write nanolithography; fine control over lateral dimensions and height | NANOINK, INC. | 2004-09-09 | — | — | US | disclosed |
| US-20040127025-A1 | Processes for fabricating conductive patterns using nanolithography as a patterning tool | NANOINK, INC. | 2004-07-01 | — | — | US | disclosed |
| WO-2004038504-A2 | NANOMETER-SCALE ENGINEERED STRUCTURES, METHODS AND APPARATUS FOR FABRICATION THEREOF, AND APPLICATIONS TO MASK REPAIR, ENHANCEMENT, AND FABRICATION | NANOINK, INC. (US) | 2004-05-06 | — | — | WO | disclosed |