SCHEMBL2138071

SCHEMBL2138071

FC1=CC(F)(F)C(F)(F)C(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14892999 0.97
SCHEMBL31372441 0.70
SCHEMBL31405852 0.69
SCHEMBL2136863 0.61
SCHEMBL4451058 0.61
SCHEMBL8020211 0.59
SCHEMBL246075 0.58
SCHEMBL1483936 0.56 MEN1 (0.33)
SCHEMBL8569526 0.56 MEN1 (0.33)
SCHEMBL733455 0.56 MEN1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111792985-A Fluorine-containing heat transfer fluid and preparation method and application thereof 北京宇极科技发展有限公司 2020-10-20 CN claimed
CN-111423306-A Method for preparing hydrohalocycloalkene by hydrolyzing halogenated cycloalkene 北京宇极科技发展有限公司 2020-07-17 CN claimed
CN-107365244-B Method for preparing 1H-perhalo cyclic olefin by hydrogen-halogen exchange reaction through hydrogen source provided by organic solvent 北京宇极科技发展有限公司 2020-05-15 CN claimed
CN-115626961-B Polymers of halogenated alkyl and halogenated alkenyl ether (meth) acrylates 阿科玛股份有限公司 2024-08-13 CN disclosed
CN-111448161-B Halogenated heteroalkenyl and heteroalkyl functionalized organic compounds and methods of making these compounds 阿科玛股份有限公司 2024-05-14 CN disclosed
CN-115611715-B Cyclic skeleton fluorine-containing ether, preparation method and application thereof 北京宇极科技发展有限公司 2023-12-08 CN disclosed
CN-116585292-A Method for inducing anesthesia 加利福尼亚大学董事会 2023-08-15 CN disclosed
CN-115626961-A Polymers of haloalkyl and haloalkenyl ether (meth) acrylates 阿科玛股份有限公司 2023-01-20 CN disclosed
EP-4032533-A1 METHODS OF INDUCING ANESTHESIA The Regents of The University of California (US) 2022-07-27 EP disclosed
US-20210322363-A1 METHODS OF INDUCING ANESTHESIA THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2021-10-21 US disclosed
CN-111792985-A Fluorine-containing heat transfer fluid and preparation method and application thereof 北京宇极科技发展有限公司 2020-10-20 CN disclosed
US-8928124-B2 High aspect ratio and reduced undercut trench etch process for a semiconductor substrate INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-01-06 US disclosed
US-8652969-B2 High aspect ratio and reduced undercut trench etch process for a semiconductor substrate INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-02-18 US disclosed
WO-2014011235-A1 METHODS OF INDUCING ANESTHESIA THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2014-01-16 WO disclosed
WO-2014011815-A2 METHODS OF INDUCING SEDATION THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2014-01-16 WO disclosed
US-20140018414-A1 METHODS OF INDUCING ANESTHESIA THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 2014-01-16 US disclosed
US-20130328173-A1 HIGH ASPECT RATIO AND REDUCED UNDERCUT TRENCH ETCH PROCESS FOR A SEMICONDUCTOR SUBSTRATE ZEON CORPORATION (JP) 2013-12-12 US disclosed
US-20130105947-A1 HIGH ASPECT RATIO AND REDUCED UNDERCUT TRENCH ETCH PROCESS FOR A SEMICONDUCTOR SUBSTRATE ZEON CORPORATION (JP) 2013-05-02 US disclosed
US-8318991-B2 Method for producing hydrogen-containing fluoroolefin compound ZEON CORPORATION (JP) 2012-11-27 US disclosed
US-20110060170-A1 METHOD FOR PRODUCING HYDROGEN-CONTAINING FLUOROOLEFIN COMPOUND ZEON CORPORATION (JP) 2011-03-10 US disclosed