⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4926419 | 0.82 | — | — | |
| SCHEMBL4542505 | 0.77 | — | — | |
| SCHEMBL3677731 | 0.77 | — | — | |
| SCHEMBL4693644 | 0.74 | — | — | |
| SCHEMBL8471704 | 0.73 | — | — | |
| SCHEMBL10580762 | 0.73 | — | — | |
| SCHEMBL9168024 | 0.73 | — | — | |
| SCHEMBL2489897 | 0.72 | — | — | |
| SCHEMBL239043 | 0.72 | — | — | |
| SCHEMBL3301824 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-8183983-A | — | — | None | — | — | JP | disclosed |
| CN-110590803-B | Dihydroartemisinin carbonyl phenol-containing conjugate, reduction product thereof, synthetic method and application | 西南大学 | 2022-03-04 | — | — | CN | disclosed |
| CN-110772947-A | Halogen gas remover, and preparation method, removing device, monitoring method and removing method thereof | 日商科莱恩触媒股份有限公司 | 2020-02-11 | — | — | CN | disclosed |
| EP-3081612-B1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO LTD (JP) | 2018-11-14 | — | — | EP | disclosed |
| US-9718999-B2 | Photocurable composition having adhesive properties | CEMEDINE CO., LTD (JP) | 2017-08-01 | — | — | US | disclosed |
| US-20160312089-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO., LTD. (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-3081612-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | Cemedine Co., Ltd. (JP) | 2016-10-19 | — | — | EP | disclosed |
| US-8288040-B2 | High voltage electrolyte | TOYOTA MOTOR ENGINEERING & MANUFACTURING NORTH AMERICA, INC. (US) | 2012-10-16 | — | — | US | disclosed |
| US-7863391-B2 | Organopolysiloxane and curable silicone composition that contains aforementioned organopolysiloxane | DOW CORNING TORAY COMPANY, LTD. (JP) | 2011-01-04 | — | — | US | disclosed |
| EP-1776395-B1 | POLYMERIZATION CATALYSTS, MAIN GROUP COORDINATION COMPOUNDS, PROCESS FOR PREPARING POLYOLEFINS AND POLYOLEFINS | BASELL POLYOLEFINE GMBH (DE) | 2010-10-13 | — | — | EP | disclosed |
| EP-1590377-A1 | POLYMERIZATION CATALYSTS, ORGANIC TRANSITION METAL COMPOUNDS, PROCESS FOR PREPARING POLYOLEFINS AND POLYOLEFINS | Basell Polyolefine GmbH (DE) | 2005-11-02 | — | — | EP | disclosed |
| JP-2005126410-A | METHOD FOR PRODUCING 3,3',5,5'-TETRAALKYL-4,4'-BIPHENOL | MITSUBISHI CHEMICALS CORP | 2005-05-19 | — | — | JP | disclosed |
| US-20040183215-A1 | Electronic device using coating epoxy resin composition | KABUSHIKI KAISHA TOSHIBA (JP) | 2004-09-23 | — | — | US | disclosed |
| WO-2004069881-A1 | POLYMERIZATION CATALYSTS, ORGANIC TRANSITION METAL COMPOUNDS, PROCESS FOR PREPARING POLYOLEFINS AND POLYOLEFINS | BASELL POLYOLEFINE GMBH (DE) | 2004-08-19 | — | — | WO | disclosed |
| US-6004730-A | Method of forming an insulating film pattern and photosensitive composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-12-21 | — | — | US | disclosed |
| US-5962581-A | POLYSILANE; IRRADIATING WITH ACTINIC RADIATION; REMOVAL SEGMENTS BY DISSOLVING IN AQUEOUS ALKALINE DEVELOPER | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-10-05 | — | — | US | disclosed |
| JP-H08183983-A | OVERBASED METAL SALT USEFUL AS ADDITIVE FOR FUEL AND LUBRICANT | LUBRIZOL CORP:THE | 1996-07-16 | — | — | JP | disclosed |
| US-4401602-A | PRE- AND POSTEMERGENCE HERBICIDES; DESICCANTS; DEFOLIATION; PLANT GROWTH REGULATORS | PPG INDUSTRIES, INC. (US) | 1983-08-30 | — | — | US | disclosed |
| US-4365099-A | CHELATION OF METALLIC IMPURITIES IN PHENOL WITH RESIN | GENERAL ELECTRIC COMPANY (US) | 1982-12-21 | — | — | US | disclosed |
| US-4344789-A | Acids and esters of 5-(2-optionally substituted-4-trifluoromethyl-6-optionally substituted phenoxy)-2-nitro, -halo, or-cyano alpha substituted phenyl carboxy oximes, and method of controlling weeds with them | PPG INDUSTRIES, INC. (US) | 1982-08-17 | — | — | US | disclosed |