⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL35088 | 0.87 | — | — | |
| SCHEMBL14028043 | 0.85 | — | — | |
| SCHEMBL19297633 | 0.84 | — | — | |
| SCHEMBL31206483 | 0.84 | — | — | |
| SCHEMBL12799460 | 0.83 | — | — | |
| SCHEMBL21403447 | 0.82 | — | — | |
| SCHEMBL331510 | 0.82 | — | — | |
| SCHEMBL1893389 | 0.80 | — | — | |
| SCHEMBL183066 | 0.80 | — | — | |
| SCHEMBL8835873 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11739184-B2 | Polysiloxazane compound having alkoxysilyl group, process for producing same, and composition and cured product including same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-29 | — | — | US | disclosed |
| CN-110317457-B | Polysilazane composition, coated substrate, and multilayer structure | 信越化学工业株式会社 | 2022-09-16 | — | — | CN | disclosed |
| EP-3798252-B1 | POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME | SHINETSU CHEMICAL CO (JP) | 2022-06-29 | — | — | EP | disclosed |
| US-11279848-B2 | Polysilazane composition, coated substrate, and multilayer construction | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-03-22 | — | — | US | disclosed |
| US-20210095079-A1 | POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-04-01 | — | — | US | disclosed |
| EP-3798252-A1 | POLYSILOXAZANE COMPOUND HAVING ALKOXYSILYL GROUP, PROCESS FOR PRODUCING SAME, AND COMPOSITION AND CURED PRODUCT INCLUDING SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 2021-03-31 | — | — | EP | disclosed |
| US-20210062040-A1 | POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-04 | — | — | US | disclosed |
| EP-3546498-B1 | POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION | SHINETSU CHEMICAL CO (JP) | 2020-10-07 | — | — | EP | disclosed |
| CN-110317457-A | Polysilazane composition, coating substrate and multilayer structure making | 信越化学工业株式会社 | 2019-10-11 | — | — | CN | disclosed |
| EP-3546498-A1 | POLYSILAZANE COMPOSITION, COATED SUBSTRATE, AND MULTILAYER CONSTRUCTION | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-10-02 | — | — | EP | disclosed |