SCHEMBL21406877

SCHEMBL21406877

CCCCC(CCCC)=[Zr](C1=CC=CC1)c1c2c(cc(C(C)(C)C)c1-c1ccc(C(C)(C)C)cc1)-c1cc(C(C)(C)C)c(-c3ccc(C(C)(C)C)cc3)cc1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL20994446 0.99
SCHEMBL21407064 0.93
Hydrochloric Acid SCHEMBL20994496 0.92
SCHEMBL3833654 0.92
SCHEMBL18240541 0.88
Hydrochloric Acid SCHEMBL20994499 0.87
SCHEMBL21407029 0.87
SCHEMBL4950031 0.86
Hydrochloric Acid SCHEMBL20994491 0.86
SCHEMBL4956874 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11492471-B2 Polypropylene resin composition and monolayer and multilayer film MITSUI CHEMICALS, INC. (JP) 2022-11-08 US disclosed
US-20190300688-A1 POLYPROPYLENE RESIN COMPOSITION AND MONOLAYER AND MULTILAYER FILM MITSUI CHEMICALS, INC. (JP) 2019-10-03 US disclosed