SCHEMBL21419670

SCHEMBL21419670

CCCCCCCSc1ccc2c3c(cccc13)C(=O)N(OS(=O)(=O)c1c(F)c(F)c(SC)c(F)c1F)C2=O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 5/20 0.39
▸ MEN1 O00255 3/20 0.39
▸ KMT2A Q03164 3/20 0.39
▸ POLB P06746 1/20 0.39
▸ L3MBTL1 Q9Y468 1/20 0.39
▸ KDM4E B2RXH2 6/20 0.35
▸ ALDH1A1 P00352 5/20 0.35
▸ HPGD P15428 5/20 0.35
▸ HTT P42858 1/20 0.35
▸ VDR P11473 2/20 0.34
▸ F2 P00734 1/20 0.34
▸ TDP1 Q9NUW8 1/20 0.33
▸ LMNA P02545 1/20 0.33
▸ THRB P10828 1/20 0.33
▸ TYMS P04818 1/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ XBP1 P17861 1/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13833419 1.00 MAPT (0.39) MAPTMEN1KMT2APOLBL3MBTL1
SCHEMBL13829264 0.95 MAPT (0.40) MAPTMEN1KMT2APOLBL3MBTL1
SCHEMBL13829209 0.85 MAPT (0.35) MAPTMEN1KMT2APOLBL3MBTL1
SCHEMBL17231430 0.84 MAPT (0.39) MAPTMEN1KMT2APOLBL3MBTL1
SCHEMBL17231444 0.84 MAPT (0.39) MAPTMEN1KMT2APOLBL3MBTL1
SCHEMBL13829124 0.83 MAPT (0.56) MAPTMEN1KMT2APOLBL3MBTL1
SCHEMBL19999246 0.82 KDM4E (0.49) MAPTMEN1KMT2AKDM4EALDH1A1
SCHEMBL18957987 0.82 MAPT (0.41) MAPTMEN1KMT2APOLBL3MBTL1
SCHEMBL13829138 0.81 MEN1 (0.41) MAPTMEN1KMT2APOLBL3MBTL1
SCHEMBL13829208 0.81 MEN1 (0.33) MAPTMEN1KMT2APOLBL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11142629-B2 Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element TOKYO OHKA KOGYO CO., LTD. (JP) 2021-10-12 — — US disclosed
US-20190300674-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT TOKYO OHKA KOGYO CO., LTD. (JP) 2019-10-03 — — US disclosed
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