SCHEMBL2144154

SCHEMBL2144154

[CH2][Si](CC(C)C)(CC(C)C)CC(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19411962 0.74
SCHEMBL3900028 0.67 TSHR (0.33)
SCHEMBL11246565 0.67 TSHR (0.33)
SCHEMBL17510885 0.65
SCHEMBL5708001 0.65 TSHR (0.33)
SCHEMBL410240 0.64
SCHEMBL892584 0.64 TSHR (0.31)
SCHEMBL892670 0.64 TSHR (0.31)
SCHEMBL2801780 0.62
SCHEMBL28501379 0.62

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103984206-B A kind of block copolymer preparation and its correlation technique 罗门哈斯电子材料有限公司 2018-05-25 CN claimed
CN-103980649-B Block copolymer composition and correlation technique thereof 罗门哈斯电子材料有限公司 2016-08-17 CN claimed
CN-103980648-B A kind of guiding self assembly copolymer compositions and correlation technique thereof 罗门哈斯电子材料有限公司 2016-08-17 CN claimed
US-8822619-B1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US claimed
US-8822615-B1 Block copolymer composition and methods relating thereto ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US claimed
US-20140227448-A1 Block copolymer composition and methods relating thereto ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-08-14 US claimed
US-20140227445-A1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-08-14 US claimed
EP-2573854-B1 NON-AQUEOUS ELECTROLYTE SOLUTION CONTAINING SILYL ESTER GROUP-CONTAINING PHOSPHONIC ACID DERIVATIVE, AND LITHIUM SECONDARY BATTERY MITSUI CHEMICALS INC (JP) 2017-01-04 EP disclosed
CN-102893443-B Nonaqueous electrolyte solution containing silyl ester group-containing phosphonic acid derivative, and lithium secondary battery MITSUI CHEMICALS, INC. (JP) 2015-12-16 CN disclosed
US-8993158-B2 Nonaqueous electrolyte solution containing silyl ester group-containing phosphonic acid derivative, and lithium secondary battery MITSUI CHEMICALS, INC. (JP) 2015-03-31 US disclosed
US-8822619-B1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US disclosed
US-8822615-B1 Block copolymer composition and methods relating thereto ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US disclosed
US-20140227448-A1 Block copolymer composition and methods relating thereto ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-08-14 US disclosed
EP-2573854-A1 NONAQUEOUS ELECTROLYTE SOLUTION CONTAINING SILYL ESTER GROUP-CONTAINING PHOSPHONIC ACID DERIVATIVE, AND LITHIUM SECONDARY BATTERY Mitsui Chemicals, Inc. (JP) 2013-03-27 EP disclosed
US-20130071732-A1 NONAQUEOUS ELECTROLYTE SOLUTION CONTAINING SILYL ESTER GROUP-CONTAINING PHOSPHONIC ACID DERIVATIVE, AND LITHIUM SECONDARY BATTERY MITSUI CHEMICALS, INC. (JP) 2013-03-21 US disclosed
CN-102893443-A Nonaqueous electrolyte solution containing silyl ester group-containing phosphonic acid derivative, and lithium secondary battery MITSUI CHEMICALS INC 2013-01-23 CN disclosed
EP-2348077-A1 Antifouling composition Jotun A/S (NO) 2011-07-27 EP disclosed
EP-0802243-B1 Coating composition NOF CORP (JP) 2001-06-27 EP disclosed
US-5795374-A SILYL ACRYLATE POLYMERS NOF CORPORATION (JP) 1998-08-18 US disclosed
EP-0802243-A2 Coating composition NOF CORPORATION (JP) 1997-10-22 EP disclosed