Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.56 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | RECQL | P46063 | 1/20 | 0.45 |
| ▸ | PKM | P14618 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | POLA1 | P09884 | 1/20 | 0.38 |
| ▸ | CNR1 | P21554 | 1/20 | 0.38 |
| ▸ | CNR2 | P34972 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18992940 | 1.00 | TSHR (0.56) | TSHRLMNAALDH1A1RECQLPKM | |
| SCHEMBL18992784 | 1.00 | TSHR (0.56) | TSHRLMNAALDH1A1RECQLPKM | |
| SCHEMBL25754056 | 0.98 | TSHR (0.58) | TSHRLMNAALDH1A1RECQLPKM | |
| SCHEMBL31404320 | 0.91 | TSHR (0.61) | TSHRLMNAALDH1A1RECQLPKM | |
| SCHEMBL5249892 | 0.86 | TSHR (0.54) | TSHRLMNAALDH1A1RECQLPKM | |
| SCHEMBL14338385 | 0.84 | TSHR (0.52) | TSHRLMNAALDH1A1RECQLPKM | |
| SCHEMBL814585 | 0.83 | TSHR (0.47) | TSHRLMNAALDH1A1RECQLPKM | |
| SCHEMBL22309985 | 0.82 | TSHR (0.50) | TSHRLMNAALDH1A1RECQLPKM | |
| SCHEMBL4767255 | 0.82 | TSHR (0.53) | TSHRLMNAALDH1A1RECQLKMT2A | |
| SCHEMBL26934165 | 0.82 | TSHR (0.50) | TSHRLMNAALDH1A1RECQLPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106518645-A | Synthetic technology of high-cis-lambda-chrysanthemumic acid | 江苏中能化学科技股份有限公司 | 2017-03-22 | — | — | CN | claimed |
| US-20200356000-A9 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2020-11-12 | — | — | US | disclosed |
| US-20190354010-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-11-21 | — | — | US | disclosed |
| US-20190310551-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND METAL OXIDE | JSR CORPORATION (JP) | 2019-10-10 | — | — | US | disclosed |
| CN-106518645-A | Synthetic technology of high-cis-lambda-chrysanthemumic acid | 江苏中能化学科技股份有限公司 | 2017-03-22 | — | — | CN | disclosed |