⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2983188 | 1.00 | — | — | |
| SCHEMBL31378260 | 1.00 | — | — | |
| SCHEMBL277977 | 0.82 | — | — | |
| SCHEMBL5878108 | 0.82 | — | — | |
| SCHEMBL29359112 | 0.71 | — | — | |
| SCHEMBL29771968 | 0.71 | — | — | |
| SCHEMBL29473632 | 0.71 | — | — | |
| SCHEMBL53481 | 0.71 | — | — | |
| SCHEMBL29417862 | 0.71 | — | — | |
| SCHEMBL2356716 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1604 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260150592-A1 | METHOD OF FORMING A SILICON ON INSULATOR SUBSTRATE | SK Hynix Inc. (KR) | 2026-05-28 | — | — | US | claimed |
| EP-4750304-A1 | METHOD OF FORMING A SILICON ON INSULATOR SUBSTRATE | SK hynix Inc. (KR) | 2026-05-27 | — | — | EP | claimed |
| US-20260107547-A1 | HIGH SENSITIVITY ETCHING WITH GERMANIUM-CONTAINING GASES | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-04-16 | — | — | US | claimed |
| US-20260047358-A1 | HIGH GROWTH RATE SELECTIVE SI:P PROCESS | APPLIED MATERIALS INC (US) | 2026-02-12 | — | — | US | claimed |
| US-12520558-B2 | High selectivity etching with germanium-containing gases | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. | 2026-01-06 | — | — | US | claimed |
| US-12484327-B2 | Pre-cleaning for a deep trench isolation structure in a pixel sensor | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-11-25 | — | — | US | claimed |
| US-20250263864-A1 | METHOD AND APPARATUS FOR LOW TEMPERATURE SELECTIVE EPITAXY IN A DEEP TRENCH | APPLIED MATERIALS, INC. | 2025-08-21 | — | — | US | claimed |
| US-12297559-B2 | Method and apparatus for low temperature selective epitaxy in a deep trench | APPLIED MATERIALS, INC. (US) | 2025-05-13 | — | — | US | claimed |
| CN-222694358-U | Mixed tail gas separation equipment and semiconductor process system | 上海良薇机电工程有限公司 | 2025-04-01 | — | — | CN | claimed |
| CN-118543227-B | Mixed tail gas separation equipment, method and semiconductor process system | 上海良薇机电工程有限公司 | 2025-03-25 | — | — | CN | claimed |
| US-4668502-A | ADDING ALKALI METAL BOROHYDRIDE TO A SOLUTION OF GERMANIUM OXIDE IN ALKALI METAL HYDROXIDE | VOLTAIX, INC. (US) | 1987-05-26 | — | — | US | claimed |
| US-4563217-A | NONIONIC SURFACTANT STABILIZERS | HITACHI, LTD. (JP) | 1986-01-07 | — | — | US | claimed |
| EP-0132594-A1 | Electroless copper plating solution | HITACHI, LTD. (JP) | 1985-02-13 | — | — | EP | claimed |
| US-4466992-A | VAPOR DEPOSITION, SEMICONDUCTORS | PHILLIPS PETROLEUM COMPANY (US) | 1984-08-21 | — | — | US | claimed |
| US-4439536-A | Hydrocarbon cracking catalyst | PHILLIPS PETROLEUM COMPANY (US) | 1984-03-27 | — | — | US | claimed |
| US-4386015-A | TREATING AGENT IS GERMANIUM OR COMPOUNDS OF GERMANIUM | PHILLIPS PETROLEUM COMPANY (US) | 1983-05-31 | — | — | US | claimed |
| US-4334979-A | TO PASSIVATE METAL DEPOSITS AND INCREASE YIELD OF GASOLINE | PHILLIPS PETROLEUM COMPANY (US) | 1982-06-15 | — | — | US | claimed |
| EP-0038047-A2 | Cracking catalyst composition, passivating process and germanium compounds | PHILLIPS PETROLEUM COMPANY (US) | 1981-10-21 | — | — | EP | claimed |
| US-4137383-A | Process for stabilizing chlorine-containing resins | SEKISUI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1979-01-30 | — | — | US | claimed |
| US-4080317-A | POLYESTERS | CIBA-GEIGY AG (CH) | 1978-03-21 | — | — | US | claimed |