SCHEMBL21469293

SCHEMBL21469293

CC(C)OCCOc1ccc(C(C)(C)c2ccc(OCCO)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 4/20 0.54
CYP3A4 P08684 1/20 0.54
KDM4E B2RXH2 7/20 0.45
ALDH1A1 P00352 6/20 0.45
MEN1 O00255 5/20 0.45
KMT2A Q03164 5/20 0.45
POLB P06746 2/20 0.45
LMNA P02545 2/20 0.45
TDP1 Q9NUW8 1/20 0.45
AR P10275 1/20 0.44
PSMB1 P20618 1/20 0.43
PSMB5 P28074 1/20 0.43
PSMB2 P49721 1/20 0.43
HTT P42858 3/20 0.43
GAA P10253 1/20 0.43
NR1I2 O75469 1/20 0.42
HIF1A Q16665 2/20 0.42
RECQL P46063 1/20 0.42
HPGD P15428 3/20 0.40
TP53 P04637 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL74884 0.92 SMN1; SMN2 (0.51) SMN1; SMN2CYP3A4KDM4EALDH1A1MEN1
SCHEMBL15784498 0.88 ESR1 (0.50) SMN1; SMN2CYP3A4KDM4EALDH1A1MEN1
SCHEMBL25527515 0.87 SMN1; SMN2 (0.47) SMN1; SMN2KDM4EALDH1A1MEN1KMT2A
SCHEMBL9818198 0.87 SMN1; SMN2 (0.68) SMN1; SMN2CYP3A4KDM4EALDH1A1MEN1
SCHEMBL79031 0.87 SMN1; SMN2 (0.68) SMN1; SMN2CYP3A4KDM4EALDH1A1MEN1
SCHEMBL24981773 0.86 SMN1; SMN2 (0.46) SMN1; SMN2KDM4EALDH1A1MEN1KMT2A
SCHEMBL18714175 0.86 SMN1; SMN2 (0.62) SMN1; SMN2KDM4EALDH1A1MEN1KMT2A
SCHEMBL15590467 0.86 SMN1; SMN2 (0.46) SMN1; SMN2KDM4EALDH1A1MEN1KMT2A
SCHEMBL16672177 0.86 SMN1; SMN2 (0.46) SMN1; SMN2KDM4EALDH1A1MEN1KMT2A
SCHEMBL24495852 0.84 SMN1; SMN2 (0.45) SMN1; SMN2CYP3A4KDM4EALDH1A1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2482132-B1 Resist pattern forming process SHINETSU CHEMICAL CO (JP) 2019-10-16 EP disclosed