⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8151395 | 0.95 | — | — | |
| Ammonia Solution, Strong SCHEMBL28760243 | 0.95 | — | — | |
| SCHEMBL27074401 | 0.95 | — | — | |
| SCHEMBL6244 | 0.94 | — | — | |
| SCHEMBL15547959 | 0.94 | TDP1 (0.31) | — | |
| SCHEMBL15547958 | 0.94 | TDP1 (0.31) | — | |
| SCHEMBL9696665 | 0.91 | — | — | |
| Ammonia Solution, Strong SCHEMBL3635387 | 0.89 | — | — | |
| SCHEMBL9117261 | 0.89 | — | — | |
| SCHEMBL5576796 | 0.89 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105566552-B | A kind of acrylate copolymer and its manufactured 248nm photoetching compositions | 江南大学 | 2019-05-17 | — | — | CN | claimed |
| CN-105566552-A | Acrylate copolymer and 248nm photoresist composition made thereof | UNIV JIANGNAN | 2016-05-11 | — | — | CN | claimed |
| EP-0792681-B1 | Process for cleaning a halogen containing gas | JAPAN PIONICS (JP) | 2002-02-13 | — | — | EP | claimed |
| US-5756060-A | CLEANING USING A METAL OXIDE | JAPAN PIONICS CO., LTD. (JP) | 1998-05-26 | — | — | US | claimed |
| EP-0792681-A1 | Process for cleaning a halogen containing gas | JAPAN PIONICS CO., LTD. (JP) | 1997-09-03 | — | — | EP | claimed |
| CN-105566552-B | A kind of acrylate copolymer and its manufactured 248nm photoetching compositions | 江南大学 | 2019-05-17 | — | — | CN | disclosed |
| CN-107289737-A | A kind of drying equipment of sodium formate | 衡阳屹顺化工有限公司 | 2017-10-24 | — | — | CN | disclosed |
| CN-105566552-A | Acrylate copolymer and 248nm photoresist composition made thereof | UNIV JIANGNAN | 2016-05-11 | — | — | CN | disclosed |
| CN-104684914-A | Pyrrolobenzodiazepines | SPIROGEN LTD | 2015-06-03 | — | — | CN | disclosed |
| CN-104540827-A | Pyrrolobenzodiazepines | UCL BUSINESS PLC | 2015-04-22 | — | — | CN | disclosed |
| CN-101573319-B | Process for preparing 1-(2-ethyl-butyl)-cyclohexanecarboxylic acid | HOFFMANN LA ROCHE | 2013-04-03 | — | — | CN | disclosed |
| US-20110166372-A1 | METHOD FOR PRODUCING OPTICALLY ACTIVE CYCLOPROPANE CARBOXYLIC ACID ESTER COMPOUND, ASYMMETRIC COPPER COMPLEX, AND OPTICALLY ACTIVE SALICYLIDENEAMINOALCOHOL COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-07 | — | — | US | disclosed |
| EP-2341042-A1 | METHOD FOR PRODUCING OPTICALLY ACTIVE CYCLOPROPANE CARBOXYLIC ACID ESTER COMPOUND, ASYMMETRIC COPPER COMPLEX, AND OPTICALLY ACTIVE SALICYLIDENEAMINOALCOHOL COMPOUND | Sumitomo Chemical Company, Limited (JP) | 2011-07-06 | — | — | EP | disclosed |
| CN-101573319-A | Process for preparing 1- (2-ethyl-butyl) -cyclohexanecarboxylic acid | HOFFMANN LA ROCHE (CH) | 2009-11-04 | — | — | CN | disclosed |
| CN-101338000-A | Co-producing process of polyvinyl alcohol and N,N-dimethylacetamide | ZHEJIANG JIANGSHAN CHEMICAL CO (CN) | 2009-01-07 | — | — | CN | disclosed |
| CN-101100424-A | Method for preparing mixed alkyl carbonate | SHENZHEN FEIYANG CHEMICAL INDU (CN) | 2008-01-09 | — | — | CN | disclosed |
| EP-0792681-B1 | Process for cleaning a halogen containing gas | JAPAN PIONICS (JP) | 2002-02-13 | — | — | EP | disclosed |
| US-5756060-A | CLEANING USING A METAL OXIDE | JAPAN PIONICS CO., LTD. (JP) | 1998-05-26 | — | — | US | disclosed |
| EP-0792681-A1 | Process for cleaning a halogen containing gas | JAPAN PIONICS CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |