Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | ATM | Q13315 | 2/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21580993 | 0.88 | ELANE (0.40) | ELANEALDH1A1KMT2AATMTSHR | |
| SCHEMBL21580994 | 0.86 | ELANE (0.32) | ELANE | |
| SCHEMBL21580998 | 0.81 | TSHR (0.38) | ELANEKMT2AATMTSHR | |
| SCHEMBL21580265 | 0.79 | ELANE (0.42) | ELANEALDH1A1KMT2AATM | |
| SCHEMBL5004362 | 0.76 | ELANE (0.42) | ELANEALDH1A1KMT2AATM | |
| SCHEMBL2266773 | 0.75 | ELANE (0.40) | ELANEALDH1A1KMT2AATMTSHR | |
| SCHEMBL21581001 | 0.75 | ELANE (0.40) | ELANEALDH1A1KMT2AATMTSHR | |
| SCHEMBL15357797 | 0.74 | ELANE (0.53) | ELANEALDH1A1KMT2AATMTSHR | |
| SCHEMBL12635204 | 0.74 | ELANE (0.39) | ELANEALDH1A1KMT2AATM | |
| SCHEMBL11807419 | 0.74 | ELANE (0.36) | ELANEALDH1A1KMT2AATMTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11548844-B2 | Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-10 | — | — | US | disclosed |
| EP-3572876-B1 | MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND RESIST PATTERN FORMING PROCESS | SHINETSU CHEMICAL CO (JP) | 2021-04-14 | — | — | EP | disclosed |
| EP-3572876-A1 | MONOMER, POLYMER, NEGATIVE RESIST COMPOSITION, PHOTOMASK BLANK, AND RESIST PATTERN FORMING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2019-11-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11548844-B2 | Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process | PARG, PCNA, PLK2 | ELANE 3015/4885ALDH1A1 3351/4885KMT2A 1791/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.