SCHEMBL2162415

SCHEMBL2162415

CC(C)C/C=C/[C]=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2162417 1.00
SCHEMBL17258238 0.74
SCHEMBL19444642 0.72
SCHEMBL2248126 0.72
SCHEMBL2248136 0.72
SCHEMBL2250057 0.72
SCHEMBL109549 0.71 TSHR (0.33)
SCHEMBL109550 0.71 TSHR (0.33)
SCHEMBL17764763 0.71 TSHR (0.33)
SCHEMBL16684952 0.69 HIF1A (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024029475-A1 WAVELENGTH CONVERSION FILM FORMING COMPOSITION 日産化学株式会社 2024-02-08 WO disclosed
US-10326138-B2 Charge storage material, electrode active material and secondary battery WASEDA UNIVERSITY (JP) 2019-06-18 US disclosed
US-10164258-B2 Fused-ring quinone-substituted polynorbornene, electrode active material and secondary battery WASEDA UNIVERSITY (JP) 2018-12-25 US disclosed
US-9871253-B2 Ion-conductive fused-ring quinone polymer, electrode active material and secondary battery WASEDA UNIVERSITY (JP) 2018-01-16 US disclosed
US-20170104214-A1 FUSED-RING QUINONE-SUBSTITUTED POLYNORBORNENE, ELECTRODE ACTIVE MATERIAL AND SECONDARY BATTERY WASEDA UNIVERSITY (JP) 2017-04-13 US disclosed
US-20170077518-A1 CHARGE STORAGE MATERIAL, ELECTRODE ACTIVE MATERIAL AND SECONDARY BATTERY WASEDA UNIVERSITY (JP) 2017-03-16 US disclosed
US-20170077517-A1 ION-CONDUCTIVE FUSED-RING QUINONE POLYMER, ELECTRODE ACTIVE MATERIAL AND SECONDARY BATTERY WASEDA UNIVERSITY (JP) 2017-03-16 US disclosed
US-7985572-B2 Modified nitrilases and their use in methods for the production of carboxylic acids BASF SE (DE) 2011-07-26 US disclosed
US-20090192153-A1 NOVEL ADENINE COMPOUND Dainippon Sumitomo Pharma Co., Ltd. a corporation of Japan (JP) 2009-07-30 US disclosed
EP-1599584-B1 MODIFIED NITRILASES AND THEIR USE IN METHODS FOR THE PRODUCTION OF CARBOXYLIC ACIDS BASF SE (DE) 2009-07-01 EP disclosed
US-6794170-B2 HALOGENATION OF PREFERENTIAL COMPOUNDS; OBTAIN COMPOUND SAMPLE, INCUBATE WITH HALOGENASE, RECOVER HALOGENATED COMPOUND BASF AKTIENGESELLSCHAFT (DE) 2004-09-21 US disclosed
US-20030096335-A1 Nucleic acid fragment and vector comprising a halogenase, and a process for halogenating chemical compounds PELZER STEFAN (DE) 2003-05-22 US disclosed
US-6566110-B1 Nucleotide sequences coding polypeptide for use tool in halogenating compounds BASF AKTIENGESELLSCHAFT (DE) 2003-05-20 US disclosed
WO-2000077182-A9 NUCLEIC ACID FRAGMENT AND VECTOR CONTAINING HALOGENASE AND METHOD FOR THE HALOGENATION OF CHEMICAL COMPOUNDS BASF AG (DE) 2002-09-12 WO disclosed
EP-1185629-A1 NUCLEIC ACID FRAGMENT AND VECTOR CONTAINING HALOGENASE AND METHOD FOR THE HALOGENATION OF CHEMICAL COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 2002-03-13 EP disclosed
EP-1129207-A1 CATALYTIC ANTIBODIES AND METHOD FOR PRODUCING CHROMANES BY CYCLIZATION WITH SAID ANTIBODIES BASF AKTIENGESELLSCHAFT (DE) 2001-09-05 EP disclosed
EP-1123386-A1 METHOD FOR PRODUCING CHIRAL CARBOXYLIC ACIDS FROM NITRILES WITH THE ASSISTANCE OF A NITRILASE OR MICROORGANISMS WHICH CONTAIN A GENE FOR THE NITRILASE BASF AKTIENGESELLSCHAFT (DE) 2001-08-16 EP disclosed
WO-2000077182-A1 NUCLEIC ACID FRAGMENT AND VECTOR CONTAINING HALOGENASE AND METHOD FOR THE HALOGENATION OF CHEMICAL COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 2000-12-21 WO disclosed
WO-2000028063-A1 CATALYTIC ANTIBODIES AND METHOD FOR PRODUCING CHROMANES BY CYCLIZATION WITH SAID ANTIBODIES BASF AKTIENGESELLSCHAFT (DE) 2000-05-18 WO disclosed
WO-2000023577-A1 METHOD FOR PRODUCING CHIRAL CARBOXYLIC ACIDS FROM NITRILES WITH THE ASSISTANCE OF A NITRILASE OR MICROORGANISMS WHICH CONTAIN A GENE FOR THE NITRILASE BASF AKTIENGESELLSCHAFT (DE) 2000-04-27 WO disclosed