⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15541274 | 0.96 | — | — | |
| SCHEMBL28249843 | 0.96 | — | — | |
| SCHEMBL30753036 | 0.76 | — | — | |
| SCHEMBL7902873 | 0.72 | — | — | |
| SCHEMBL27985458 | 0.69 | — | — | |
| Ammonia Solution, Strong SCHEMBL28082285 | 0.67 | — | — | |
| SCHEMBL28098947 | 0.65 | — | — | |
| Formic Acid Methyl Ester SCHEMBL27996317 | 0.64 | — | — | |
| SCHEMBL6407829 | 0.64 | — | — | |
| SCHEMBL17686893 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 289 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12604656-B2 | Large-area perovskite layer and preparation method therefor | TRINA SOLAR CO., LTD (CN) | 2026-04-14 | — | — | US | claimed |
| CN-120152504-A | Wide-band gap perovskite solar cell based on amide-based additive and preparation method thereof | 南开大学 | 2025-06-13 | — | — | CN | claimed |
| CN-114824092-B | Solar cell based on quasi-two-dimensional perovskite and preparation method thereof | 北京炎和科技有限公司 | 2025-04-18 | — | — | CN | claimed |
| CN-119789748-A | Perovskite precursor solution, perovskite solar cell and preparation method | 天合光能股份有限公司 | 2025-04-08 | — | — | CN | claimed |
| CN-115332446-B | Intrinsic ion gate metal halide perovskite diode and preparation method thereof | 福建师范大学 | 2025-02-28 | — | — | CN | claimed |
| CN-114883493-B | Perovskite solar cell based on three dimensions/two dimensions and preparation method thereof | 北京炎和科技有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119156026-A | RP phase perovskite nanocrystalline modified three-dimensional perovskite solar cell | 河北工业大学 | 2024-12-17 | — | — | CN | claimed |
| WO-2024244864-A1 | SLURRY COMPOSITION AND PREPARATION METHOD THEREFOR, ELECTRON TRANSPORT FILM LAYER AND PREPARATION METHOD THEREFOR, AND PEROVSKITE SOLAR CELL AND PREPARATION METHOD THEREFOR | 通威太阳能（成都）有限公司 | 2024-12-05 | — | — | WO | claimed |
| CN-118922001-A | Carbon-based organic-inorganic perovskite solar cell based on 3-trifluoromethyl phenethylamine hydroiodidate modification | 河北工业大学 | 2024-11-08 | — | — | CN | claimed |
| US-20240373744-A1 | LARGE-AREA PEROVSKITE LAYER AND PREPARATION METHOD THEREFOR | TRINA SOLAR CO., LTD (CN) | 2024-11-07 | — | — | US | claimed |
| CN-112071991-A | Method for preparing perovskite film through screen printing | 西北工业大学 | 2020-12-11 | — | — | CN | claimed |
| CN-112071987-A | Ionic liquid perovskite medium and preparation method thereof | 西北工业大学 | 2020-12-11 | — | — | CN | claimed |
| CN-111952456-A | Efficient and stable perovskite solar cell based on novel ionic liquid methylamine formate and preparation method and application thereof | 南京工业大学 | 2020-11-17 | — | — | CN | claimed |
| CN-111710780-A | Preparation method of cathode in-situ modified perovskite solar cell without electron transport layer | 西北工业大学 | 2020-09-25 | — | — | CN | claimed |
| CN-107532206-A | Substrate molecule | 龙公司 | 2018-01-02 | — | — | CN | claimed |
| EP-0680078-B1 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-03-12 | — | — | EP | claimed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | claimed |
| US-5630904-A | Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 1997-05-20 | — | — | US | claimed |
| EP-0680078-A2 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-11-02 | — | — | EP | claimed |
| CN-1100718-A | Aminomethyl formate-1,1,1-trichloro-2-(2,4-dichlorothiophenyl)-ethyl ester and the prepn. method | WANG GUIYING (CN) | 1995-03-29 | — | — | CN | claimed |