⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3139973 | 0.86 | — | — | |
| SCHEMBL3128998 | 0.84 | — | — | |
| SCHEMBL3132414 | 0.82 | — | — | |
| SCHEMBL3132620 | 0.82 | — | — | |
| SCHEMBL3135905 | 0.82 | — | — | |
| SCHEMBL3135838 | 0.82 | — | — | |
| SCHEMBL3132575 | 0.82 | — | — | |
| SCHEMBL3144374 | 0.82 | — | — | |
| SCHEMBL3134154 | 0.82 | — | — | |
| SCHEMBL3140023 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8088566-B2 | Photoresists; using compound containing an orgaooxygen or organosulfur compound | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | claimed |
| EP-0850211-A1 | PROCESS FOR THE PREPARATION OF 4-BROMO-1,1-DIFLUOROBUT-1-ENE AND 2,4-DIBROMO-1,1,1-TRIFLUOROBUTANE | ZENECA LIMITED (GB) | 1998-07-01 | — | — | EP | claimed |
| WO-1997009292-A1 | PROCESS FOR THE PREPARATION OF 4-BROMO-1,1-DIFLUOROBUT-1-ENE AND 2,4-DIBROMO-1,1,1-TRIFLUOROBUTANE | ZENECA LIMITED (GB) | 1997-03-13 | — | — | WO | claimed |
| US-20260133489-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-05-14 | — | — | US | disclosed |
| US-20260062515-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-03-05 | — | — | US | disclosed |
| US-20260063996-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-03-05 | — | — | US | disclosed |
| US-20250291248-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-09-18 | — | — | US | disclosed |
| US-20250020997-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| EP-4204597-A1 | SURFACE COATED POROUS SUBSTRATES AND PARTICLES AND SYSTEMS AND METHODS THEREOF | Sila Nanotechnologies Inc. (US) | 2023-07-05 | — | — | EP | disclosed |
| US-20230176481-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-06-08 | — | — | US | disclosed |
| US-20230163345-A1 | LITHIUM FLUORIDE-BASED AND RELATED CATHODE COMPOSITIONS AND BATTERIES COMPRISING THE SAME | SILA NANOTECHNOLOGIES, INC. | 2023-05-25 | — | — | US | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2005-10-20 | — | — | US | disclosed |
| US-20040247900-A1 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2004-12-09 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-6599922-B2 | Process for the preparation of 2,5-bis-(2,2,2-trifluoroethoxy)-N-(2-piperidylmethyl)-benzamide (FLECAINIDE) | A.M.S.A. ANONIMA MATERIE SINTETICHE E AFFINI S.P.A. (IT) | 2003-07-29 | — | — | US | disclosed |
| US-20030032835-A1 | Antiarrhythmia agents | A.M.S.A. ANONIMA MATERIE SINTETICHE E AFFINI S.P.A (IT) | 2003-02-13 | — | — | US | disclosed |
| EP-1283201-A1 | Process for the preparation of 2,5-bis-(2,2,2-trifluoroethoxy)-n-(2-piperidyl-methyl)-benzamide (flecanide) | A.M.S.A. ANONIMA MATERIE SINTETICHE E AFFINI S.p.A. (IT) | 2003-02-12 | — | — | EP | disclosed |
| EP-0850211-A1 | PROCESS FOR THE PREPARATION OF 4-BROMO-1,1-DIFLUOROBUT-1-ENE AND 2,4-DIBROMO-1,1,1-TRIFLUOROBUTANE | ZENECA LIMITED (GB) | 1998-07-01 | — | — | EP | disclosed |
| WO-1997009292-A1 | PROCESS FOR THE PREPARATION OF 4-BROMO-1,1-DIFLUOROBUT-1-ENE AND 2,4-DIBROMO-1,1,1-TRIFLUOROBUTANE | ZENECA LIMITED (GB) | 1997-03-13 | — | — | WO | disclosed |