Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | CASP3 | P42574 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.36 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.36 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.36 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | CYP19A1 | P11511 | 4/20 | 0.31 |
| ▸ | PDE9A | O76083 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2168812 | 0.89 | CYP1A2 (0.46) | CYP1A2TSHRALDH1A1CA1CA9 | |
| SCHEMBL10552613 | 0.87 | CYP1A2 (0.53) | CYP1A2TSHRALDH1A1TP53CYP19A1 | |
| SCHEMBL8920038 | 0.85 | CYP1A2 (0.56) | CYP1A2TSHRALDH1A1CYP19A1 | |
| SCHEMBL9235925 | 0.85 | CYP1A2 (0.56) | CYP1A2TSHRALDH1A1CYP19A1 | |
| SCHEMBL8921125 | 0.85 | CYP1A2 (0.56) | CYP1A2TSHRALDH1A1CYP19A1 | |
| SCHEMBL8921784 | 0.85 | CYP1A2 (0.56) | CYP1A2TSHRALDH1A1CYP19A1 | |
| SCHEMBL8343473 | 0.85 | CYP1A2 (0.56) | CYP1A2TSHRALDH1A1CYP19A1 | |
| SCHEMBL8921336 | 0.85 | CYP1A2 (0.56) | CYP1A2TSHRALDH1A1CYP19A1 | |
| SCHEMBL8922468 | 0.85 | CYP1A2 (0.56) | CYP1A2TSHRALDH1A1CYP19A1 | |
| SCHEMBL1396847 | 0.85 | CYP1A2 (0.56) | CYP1A2TSHRALDH1A1CYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109423309-B | Liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display assembly | 奇美实业股份有限公司 | 2023-08-04 | — | — | CN | disclosed |
| CN-109423307-B | Liquid crystal alignment agent, method for producing liquid crystal alignment film, and liquid crystal display element | 奇美实业股份有限公司 | 2023-07-04 | — | — | CN | disclosed |
| CN-109062007-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2023-03-10 | — | — | CN | disclosed |
| CN-107885034-B | Negative white photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2023-03-07 | — | — | CN | disclosed |
| CN-108693710-B | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2022-12-02 | — | — | CN | disclosed |
| CN-107043630-B | Liquid crystal alignment agent, liquid crystal alignment film and liquid crystal display assembly | 奇美实业股份有限公司 | 2022-08-02 | — | — | CN | disclosed |
| CN-107179652-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2022-02-08 | — | — | CN | disclosed |
| CN-105717747-B | Photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2021-12-21 | — | — | CN | disclosed |
| CN-105717743-B | Photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2021-12-21 | — | — | CN | disclosed |
| CN-106154750-B | Photosensitive polysiloxane composition, protective film and element with protective film | 奇美实业股份有限公司 | 2021-09-14 | — | — | CN | disclosed |
| US-20140178819-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2014-06-26 | — | — | US | disclosed |
| US-20140178822-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2014-06-26 | — | — | US | disclosed |
| US-20130310497-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2013-11-21 | — | — | US | disclosed |
| US-20130280541-A1 | PHOTO-CURING POLYSILOXANE COMPOSITION AND APPLICATION THEREOF | CHI MEI CORPORATION (TW) | 2013-10-24 | — | — | US | disclosed |
| US-20130260108-A1 | PHOTO-CURING POLYSILOXAN COMPOSITION AND APPLICATIONS THEREOF | CHI MEI CORPORATION (TW) | 2013-10-03 | — | — | US | disclosed |
| US-7985476-B2 | Transparent zirconia dispersion and zirconia particle-containing resin composition, composition for sealing light emitting element and light emitting element, hard coat film and optical functional film and optical component, and method for producing zirconia particle-containing resin | SUMITOMO OSAKA CEMENT CO., LTD. (JP) | 2011-07-26 | — | — | US | disclosed |
| US-20090140284-A1 | Transparent Inorganic Oxide Dispersion and Iorganic Oxide Particle-Containing Resin Composition, Composition for Sealing Light Emitting Element and Light Emitting element, Hard Coat Film and Optical Functional Film and Optical Component, and Method for Producing Inorganic Oxide Pariticle-Containing Resin | SUMITOMO OSAKA CEMENT CO., LTD. (JP) | 2009-06-04 | — | — | US | disclosed |
| EP-1950239-A1 | TRANSPARENT INORGANIC-OXIDE DISPERSION, RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES, COMPOSITION FOR ENCAPSULATING LUMINESCENT ELEMENT, LUMINESCENT ELEMENT, HARD COAT, OPTICAL FUNCTIONAL FILM, OPTICAL PART, AND PROCESS FOR PRODUCING RESIN COMPOSITION CONTAINING INORGANIC OXIDE PARTICLES | SUMITOMO OSAKA CEMENT CO., LTD. (JP) | 2008-07-30 | — | — | EP | disclosed |
| EP-0608132-B1 | Coating varnish composition and antifouling coating composition | HITACHI CHEMICAL CO LTD (JP) | 1998-05-20 | — | — | EP | disclosed |
| US-5439511-A | Composition containing polymer obtained by polymerizing unsaturated acid anhydride and another unsaturated compound, specified additive | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1995-08-08 | — | — | US | disclosed |