⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18431954 | 0.80 | CYP1A2 (0.30) | — | |
| SCHEMBL19325466 | 0.77 | — | — | |
| SCHEMBL26603975 | 0.77 | — | — | |
| SCHEMBL21396819 | 0.77 | EPHX2 (0.42) | — | |
| SCHEMBL15293054 | 0.76 | CYP1A2 (0.32) | — | |
| SCHEMBL18607984 | 0.76 | CYP1A2 (0.34) | — | |
| SCHEMBL18649749 | 0.75 | GRIN2D (0.34) | — | |
| SCHEMBL23206979 | 0.74 | EPHX2 (0.40) | — | |
| SCHEMBL20013683 | 0.74 | — | — | |
| SCHEMBL18485238 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230221640-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| US-20210200098-A1 | PATTERN FORMING METHOD AND RESIST LAMINATE FOR ORGANIC SOLVENT DEVELOPMENT | FUJIFILM CORPORATION (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20200050106-A1 | PHOTOSENSITIVE COMPOSITION FOR EUV LIGHT, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2020-02-13 | — | — | US | disclosed |