SCHEMBL217238

SCHEMBL217238

CCCCOCCOCCOCCOCCCC

nearest known ligand 0.67

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.67
CYP3A4 P08684 3/20 0.62
THRB P10828 2/20 0.57
MEN1 O00255 1/20 0.57
HTT P42858 1/20 0.57
KMT2A Q03164 1/20 0.57
MAPT P10636 1/20 0.57
ADRB2 P07550 1/20 0.50
ADRB1 P08588 1/20 0.50
ADRB3 P13945 1/20 0.50
SMN1; SMN2 Q16637 2/20 0.46
HPGD P15428 1/20 0.46
LMNA P02545 1/20 0.43
ALDH1A1 P00352 2/20 0.41
CES2 O00748 1/20 0.40
RARB P10826 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8636270 1.00 TSHR (0.67) TSHRCYP3A4THRBMEN1HTT
SCHEMBL39514 1.00 TSHR (0.67) TSHRCYP3A4THRBMEN1HTT
SCHEMBL39603 1.00 TSHR (0.67) TSHRCYP3A4THRBMEN1HTT
SCHEMBL27130 1.00 TSHR (0.67) TSHRCYP3A4THRBMEN1HTT
SCHEMBL1133315 1.00 TSHR (0.67) TSHRCYP3A4THRBMEN1HTT
SCHEMBL30673 1.00 TSHR (0.67) TSHRCYP3A4THRBMEN1HTT
SCHEMBL1132722 1.00 TSHR (0.67) TSHRCYP3A4THRBMEN1HTT
SCHEMBL988078 1.00 TSHR (0.67) TSHRCYP3A4THRBMEN1HTT
SCHEMBL23784490 0.96 TSHR (0.63) TSHRCYP3A4THRBMEN1HTT
SCHEMBL13335222 0.96 TSHR (0.63) TSHRCYP3A4THRBMEN1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2083 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260138079-A1 SYSTEMS FOR REMOVING CARBON DIOXIDE FROM A CARBON DIOXIDE CONTAINING GAS, AND RELATED METHODS Schlumberger Tech Corporation (US) 2026-05-21 US claimed
US-20260106218-A1 POLYMER ELECTROLYTE AND ELECTROCHEMICAL DEVICE COMPRISING SAME FACTORIAL INC (US) 2026-04-16 US claimed
EP-4690342-A2 SHELF STABLE ELECTROLYTE COMPOSITION, POLYMER ELECTROLYTE FREE OF VISIBLE BUBBLES AND SOLID-STATE BATTERIES COMPRISING SAME Factorial Inc. (US) 2026-02-11 EP claimed
US-12478918-B1 Systems for removing carbon dioxide from a carbon dioxide containing gas, and related methods SCHLUMBERGER TECHNOLOGY CORPORATION (US) 2025-11-25 US claimed
US-12463250-B2 Electrochemical cell having electrolyte with polymer localized on electrode surface FACTORIAL INC. (US) 2025-11-04 US claimed
US-20250257242-A1 CMP POLISHING LIQUID AND POLISHING METHOD RESONAC CORPORATION (JP) 2025-08-14 US claimed
CN-119407397-A High-efficiency jet soldering paste and preparation method thereof 东莞永安科技有限公司 2025-02-11 CN claimed
CN-118867396-A Electrolyte for lithium secondary battery, application of electrolyte, lithium secondary battery and power utilization device 杭州建德盛开新材料有限公司 2024-10-29 CN claimed
WO-2024212951-A1 ELECTROLYTE FOR LITHIUM SECONDARY BATTERY AND USE THEREOF, LITHIUM SECONDARY BATTERY AND ELECTRIC DEVICE 杭州建德盛开新材料有限公司 2024-10-17 WO claimed
WO-2024205956-A2 SHELF STABLE ELECTROLYTE COMPOSITION, POLYMER ELECTROLYTE FREE OF VISIBLE BUBBLES AND SOLID-STATE BATTERIES COMPRISING SAME FACTORIAL INC. (US) 2024-10-03 WO claimed
US-5661205-A COPOLYMERIZED WITH AN ETHYLENICALLY UNSATURATED CARBOXYLIC ACID IN THE PRESENCE OF POLYVINYL ALCOHOL AND A GLYCOL ETHER; ADHESIVES DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1997-08-26 US claimed
US-5512198-A WEAR RESISTANCE NIPPON OIL CO., LTD. (JP) 1996-04-30 US claimed
US-5475107-A Process for obtaining 3,7-dialkylxanthines from 3-alkyl-xanthines HOECHST-ROUSSEL PHARMACEUTICALS INCORPORATED (US) 1995-12-12 US claimed
EP-0648788-A1 Method for producing a polychloroprene latex DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1995-04-19 EP claimed
EP-0406768-B1 Process for eliminating a mixture of solvents from a gas stream HOECHST AG (DE) 1994-01-12 EP claimed
US-5164816-A Polyamides, polyimides HITACHI CHEMICAL CO., LTD. (JP) 1992-11-17 US claimed
US-5087658-A HEAT-RESISTANT RESIN PASTE AND INTEGRATED CIRCUIT DEVICE PRODUCED BY USING THE HEAT-RESISTANT RESIN PASTE HITACHI CHEMICAL COMPANY, LTD. (JP) 1992-02-11 US claimed
US-5071454-A Absorption with alkylene glycol ethers HOECHST AKTIENGESELLSCHAFT (DE) 1991-12-10 US claimed
US-4075830-A Solid adhesive compositions KONISHI CO., LTD. (JA) 1978-02-28 US claimed
US-4073756-A WAX-LIKE OR JELLY-LIKE AT ROOM TEMPERATURE KONISHI CO., LTD. (JA) 1978-02-14 US claimed