SCHEMBL21753750

SCHEMBL21753750

N[Si]1(N)CCCCO1.[SiH3]O[SiH2]O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL168377 0.82
SCHEMBL27870739 0.70
SCHEMBL9815467 0.62
Fluoride SCHEMBL9317915 0.61
SCHEMBL7024319 0.58
SCHEMBL5083875 0.58
SCHEMBL818682 0.58
SCHEMBL20857020 0.58
SCHEMBL117360 0.58
SCHEMBL1531466 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2020039966-A1 FILM FORMATION MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND PATTERN FORMATION METHOD 三菱瓦斯化学株式会社 2020-02-27 WO disclosed