N-Benzylaniline

N-Benzylaniline

SCHEMBL2176624

N.c1ccc(CNc2ccccc2)cc1

nearest known ligand 0.95

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.68
CYP1A2 P05177 2/20 0.61
MEN1 O00255 1/20 0.61
CYP3A4 P08684 1/20 0.61
CYP2C9 P11712 1/20 0.61
CYP2C19 P33261 1/20 0.61
KMT2A Q03164 1/20 0.61
LTA4H P09960 1/20 0.61
FFAR1 O14842 2/20 0.57
PTPN1 P18031 2/20 0.57
CA1 P00915 2/20 0.57
CA2 P00918 2/20 0.57
CA12 O43570 1/20 0.57
CA9 Q16790 1/20 0.57
ALDH1A1 P00352 1/20 0.57
CYP2D6 P10635 1/20 0.57
PTPRF P10586 1/20 0.57
PTPN2 P17706 1/20 0.57
PTPN11 Q06124 1/20 0.57
KCNH3 Q9ULD8 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22628164 0.97 HTT (0.71) HTTCYP1A2MEN1CYP3A4CYP2C9
N-Benzylaniline SCHEMBL7840 0.97 HTT (0.71) HTTCYP1A2MEN1CYP3A4CYP2C9
N-Benzylaniline SCHEMBL357137 0.95 HTT (0.68) HTTCYP1A2MEN1CYP3A4CYP2C9
N-Benzylaniline SCHEMBL27620362 0.95 HTT (0.68) HTTCYP1A2MEN1CYP3A4CYP2C9
N-Benzylaniline SCHEMBL3602124 0.95 HTT (0.68) HTTCYP1A2MEN1CYP3A4CYP2C9
N-Benzylaniline SCHEMBL10963734 0.92 HTT (0.65) HTTCYP1A2MEN1CYP3A4CYP2C9
SCHEMBL2065031 0.92 CYP1A2 (0.69) HTTCYP1A2MEN1CYP3A4CYP2C9
SCHEMBL1924100 0.92 HTT (0.78) HTTCYP1A2MEN1CYP3A4CYP2C9
N-Benzylaniline SCHEMBL19915239 0.88 HTT (0.61) HTTCYP1A2MEN1CYP3A4CYP2C9
SCHEMBL2741249 0.88 HTT (0.67) HTTCYP1A2MEN1CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109317144-A A kind of preparation method of high activity sulfur poisoning-resistant palladium carbon catalyst 西安凯立新材料股份有限公司 2019-02-12 CN disclosed
CN-109317144-A A kind of preparation method of high activity sulfur poisoning-resistant palladium carbon catalyst 西安凯立新材料股份有限公司 2019-02-12 CN disclosed
CN-103084134-B Dynamic hole jet mixed reactor and method for producing diphenyl methane series diamine and polyamine by using same WANHUA CHEMICAL GROUP CO LTD 2015-04-22 CN disclosed
EP-2513038-B1 TWO-STAGE METHOD FOR COST-EFFECTIVE SEPARATION OF HOMOGENEOUS CATALYSTS IN MDA SYNTHESIS BASF SE (DE) 2015-02-25 EP disclosed
US-8759585-B2 Two-stage process for cost-effective deposition of homogeneous catalysts in MDA synthesis BASF SE (DE) 2014-06-24 US disclosed
CN-103084134-A Dynamic hole jet mixed reactor and method for producing diphenyl methane series diamine and polyamine by using same YANTAI WANHUA POLYURETHANES CO 2013-05-08 CN disclosed
EP-2513038-A1 TWO-STAGE METHOD FOR COST-EFFECTIVE SEPARATION OF HOMOGENEOUS CATALYSTS IN MDA SYNTHESIS BASF SE (DE) 2012-10-24 EP disclosed
US-20120232307-A1 TWO-STAGE PROCESS FOR COST-EFECTIVE DEPOSITION OF HOMOGENEOUS CATALYSTS IN MDA SYNTHESIS BASF SE (DE) 2012-09-13 US disclosed
WO-2011080059-A1 TWO-STAGE METHOD FOR COST-EFFECTIVE SEPARATION OF HOMOGENEOUS CATALYSTS IN MDA SYNTHESIS BASF SE (DE) 2011-07-07 WO disclosed
CN-101279923-B Preparation of polymethylene polyphenyl polyamine NINGBO WANHUA POLYURETHANES CO 2010-08-25 CN disclosed
CN-101279923-A Preparation of polymethylene polyphenyl polyamine NINGBO WANHUA POLYURETHANES CO (CN) 2008-10-08 CN disclosed
CN-1160319-C Method for producing mixtures consisting of diphenylmethane diisocyanates and polyphenylene-polymethylene-polyisocyanates containing a reduced amount of chlorinated secondary products �����ɷ� 2004-08-04 CN disclosed
CN-1298385-A Method for producing mixtures consisting of diphenylmethane diisocyanates and polyphenylene-polymethylene-polyisocyanates containing a reduced amount of chlorinated secondary products BASF AG (DE) 2001-06-06 CN disclosed