⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7055702 | 0.84 | APP (0.44) | — | |
| SCHEMBL6161210 | 0.82 | APP (0.42) | — | |
| SCHEMBL10421344 | 0.80 | APP (0.41) | — | |
| SCHEMBL29575860 | 0.80 | APEX1 (0.46) | — | |
| SCHEMBL2459462 | 0.78 | — | — | |
| SCHEMBL536402 | 0.77 | PTGS1 (0.35) | — | |
| SCHEMBL4917489 | 0.77 | — | — | |
| SCHEMBL1893550 | 0.76 | — | — | |
| Potassium SCHEMBL9347201 | 0.75 | PTGS1 (0.33) | — | |
| SCHEMBL9513534 | 0.75 | PTGS1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10662272-B2 | Polishing composition for magnetic disk substrate | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2020-05-26 | — | — | US | claimed |
| US-10577445-B2 | Polishing composition for magnetic disk substrate | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2020-03-03 | — | — | US | claimed |
| US-20190119423-A1 | POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2019-04-25 | — | — | US | claimed |
| US-20190119422-A1 | POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2019-04-25 | — | — | US | claimed |
| JP-11263892-A | — | — | None | — | — | JP | disclosed |
| WO-2024150589-A1 | METHOD AND DEVICE FOR TREATING WASTEWATER USING REVERSE OSMOSIS MEMBRANE | 栗田工業株式会社 | 2024-07-18 | — | — | WO | disclosed |
| WO-2024029162-A1 | METHOD FOR OPERATING REVERSE OSMOSIS MEMBRANE DEVICE | 栗田工業株式会社 | 2024-02-08 | — | — | WO | disclosed |
| EP-4317337-A1 | POLISHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, AND POLISHING COMPOSITION SET | Fujimi Incorporated (JP) | 2024-02-07 | — | — | EP | disclosed |
| WO-2022202688-A1 | POLISHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, AND POLISHING COMPOSITION SET | 株式会社フジミインコーポレーテッド | 2022-09-29 | — | — | WO | disclosed |
| CN-113993968-A | Polishing composition | 福吉米株式会社 | 2022-01-28 | — | — | CN | disclosed |
| US-11130694-B2 | Recovery method for discharged cooling water | KURITA WATER INDUSTRIES LTD. (JP) | 2021-09-28 | — | — | US | disclosed |
| US-20210198524-A1 | POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE | YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) | 2021-07-01 | — | — | US | disclosed |
| US-20130032571-A1 | METHOD FOR MANUFACTURING AN ALUMINOSILICATE GLASS SUBSTRATE FOR HARD DISKS | KAO CORPORATION (JP) | 2013-02-07 | — | — | US | disclosed |
| US-20110240594-A1 | POLISHING LIQUID COMPOSITION FOR MAGNETIC-DISK SUBSTRATE | KAO CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20110203186-A1 | POLISHING LIQUID COMPOSITION FOR MAGNETIC DISK SUBSTRATE | KAO CORPORATION (JP) | 2011-08-25 | — | — | US | disclosed |
| US-7972398-B2 | Polishing composition for glass substrate | KAO CORPORATION (JP) | 2011-07-05 | — | — | US | disclosed |
| US-20080006057-A1 | Polishing composition for glass substrate | KAO CORPORATION | 2008-01-10 | — | — | US | disclosed |
| US-20070145014-A1 | Polishing composition for glass substrate | KAO CORPORATION | 2007-06-28 | — | — | US | disclosed |
| US-6440856-B1 | GOOD FOR CHEMICAL MECHANICAL POLISHING ABRASIVE PARTICLES SUCH AS SILICA AND ALUMINA; POLYMER OR COPOLYMER HAVING AT LEAST ONE GROUP SELECTED FROM THE GROUP CONSISTING OF SULFONIC ACID AND CARBOXYLIC ACID | JSR CORPORATION (JP) | 2002-08-27 | — | — | US | disclosed |
| JP-H11263892-A | SCALE PREVENTIVE | JSR CORP | 1999-09-28 | — | — | JP | disclosed |